Tetrafluoroethylene

Tetrafluoroethylene

SCHEMBL1821373

FC(F)=C(F)F.Nc1nc(N)nc(N)n1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.41
▸ CASP1 P29466 1/20 0.38
▸ CYP1A2 P05177 1/20 0.38
▸ NPC1 O15118 3/20 0.33
▸ POLB P06746 1/20 0.33
▸ ADORA3 P0DMS8 1/20 0.33
▸ ADORA2A P29274 1/20 0.33
▸ ADORA2B P29275 1/20 0.33
▸ ADORA1 P30542 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28297705 0.88 LMNA (0.43) LMNACASP1CYP1A2NPC1POLB
Hydroxyamine SCHEMBL8577072 0.79 LMNA (0.47) LMNACASP1CYP1A2NPC1POLB
SCHEMBL29485005 0.78 — —
SCHEMBL29900242 0.78 — —
SCHEMBL8356506 0.78 CASP1 (0.50) LMNACASP1CYP1A2NPC1POLB
SCHEMBL29876207 0.78 — —
SCHEMBL8465809 0.78 CASP1 (0.50) LMNACASP1CYP1A2NPC1POLB
SCHEMBL9579151 0.78 CASP1 (0.50) LMNACASP1CYP1A2NPC1POLB
SCHEMBL25853 0.78 — —
SCHEMBL8975601 0.75 LMNA (0.45) LMNACASP1CYP1A2NPC1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11648382-B2 Microneedle structure and manufacturing method and manufacturing apparatus for the same KOREA INSTITUTE OF MACHINERY & MATERIALS (KR) 2023-05-16 — — US disclosed
US-20200261708-A1 MICRONEEDLE STRUCTURE AND MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR THE SAME KOREA INSTITUTE OF MACHINERY & MATERIALS (KR) 2020-08-20 — — US disclosed
US-8524325-B2 Method for producing photocatalytic coating material TOTO LTD. (JP) 2013-09-03 — — US disclosed
US-8512855-B2 Self-cleaning member and coating composition TOTO LTD. (JP) 2013-08-20 — — US disclosed
EP-2316895-B1 Self-cleaning water-based coating compositions, and self-cleaning member TOTO LTD (JP) 2013-05-29 — — EP disclosed
EP-2316895-A1 Photocatalytic coating material, photocatalytic composite material and process for producing the same, self-cleaning water-based coating compositions, and self-cleaning member Toto Ltd. (JP) 2011-05-04 — — EP disclosed
US-20100304120-A1 Self-cleaning member and coating composition TOTO LTD. (JP) 2010-12-02 — — US disclosed
EP-2153897-A1 Transparent photocatalytic composition for internal and external building construction elements Neoformula Consulting & Développement (FR) 2010-02-17 — — EP disclosed
US-20090226620-A1 Method for producing photocatalytic coating material TOTO LTD.- 84% (JP) 2009-09-10 — — US disclosed
US-7572486-B2 Photocatalytic coating material, photocatalytic composite material and method for producing the same, and self-cleaning water-based coating composition and self-cleaning member TOTO LTD. (JP) 2009-08-11 — — US disclosed
US-20050277543-A1 Photocatalytic coating material, photocatalytic composite material and method for producing the same, and self-cleaning water-based coating composition and self-cleaning member TOTO LTD. (JP) 2005-12-15 — — US disclosed
EP-1512728-A1 PHOTOCATALYTIC COATING MATERIAL, PHOTOCATALYTIC COMPOSITE MATERIAL AND PROCESS FOR PRODUCING THE SAME, SELF-CLEANING WATER-BASED COATING COMPOSITIONS, AND SELF-CLEANING MEMBER TOTO LTD. (JP) 2005-03-09 — — EP disclosed
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