SCHEMBL18243252

SCHEMBL18243252

CCC[CH]c1ccc(C(F)(F)C(F)(F)C(F)(F)F)cc1C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18241840 0.95 — —
SCHEMBL18378363 0.89 AR (0.31) —
SCHEMBL18378079 0.88 AR (0.30) —
SCHEMBL18243299 0.84 AR (0.30) —
SCHEMBL18378103 0.80 AR (0.34) —
SCHEMBL18243046 0.80 — —
SCHEMBL18378246 0.80 NFKB1 (0.30) —
SCHEMBL18242681 0.78 CES2 (0.40) —
SCHEMBL18242019 0.76 NR1H2 (0.32) —
SCHEMBL18378334 0.76 AR (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10451967-B2 Acid- and radical-generating agent and method for generating acid and radical FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-22 — — US disclosed
US-20160342084-A1 ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2016-11-24 — — US disclosed
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