SCHEMBL1826302

SCHEMBL1826302

C[CH]C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
TSHR P16473 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9323333 0.97 KDM4E (0.31) KDM4ETSHRTDP1
SCHEMBL1827147 0.92 KDM4E (0.33) KDM4ETSHRTDP1
SCHEMBL1825796 0.80
SCHEMBL498059 0.76 KDM4E (0.43) KDM4ETSHRTDP1
SCHEMBL9493877 0.76 KDM4E (0.33) KDM4ETSHRTDP1
SCHEMBL25401618 0.74 KDM4E (0.37) KDM4ETSHRTDP1
SCHEMBL9496803 0.74 KDM4E (0.32) KDM4ETSHRTDP1
SCHEMBL15402599 0.74 KDM4E (0.32) KDM4ETSHRTDP1
SCHEMBL7754978 0.74 KDM4E (0.32) KDM4ETSHRTDP1
SCHEMBL1311092 0.74 KDM4E (0.32) KDM4ETSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed