SCHEMBL18258571

SCHEMBL18258571

CCCOC(=O)c1cc(C(=O)OC(=O)c2cc(C(=O)OCCC)cc3ccccc23)c2ccccc2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.54
ALDH1A1 P00352 6/20 0.51
KDM4E B2RXH2 5/20 0.50
HSD17B10 Q99714 1/20 0.50
TSHR P16473 5/20 0.45
TDP1 Q9NUW8 2/20 0.45
ESR1 P03372 1/20 0.45
CHRM1 P11229 1/20 0.45
SLC6A2 P23975 1/20 0.45
KDR P35968 1/20 0.45
MAOB P27338 2/20 0.44
MAPT P10636 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.42
POLB P06746 1/20 0.42
CDC25B P30305 1/20 0.42
MAPK1 P28482 2/20 0.41
ELANE P08246 1/20 0.41
NPC1 O15118 1/20 0.41
CNR2 P34972 2/20 0.41
CNR1 P21554 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL163059 0.83 LMNA (0.57) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL163060 0.83 LMNA (0.57) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL15935996 0.82 CDC25B (0.60) ALDH1A1KDM4EHSD17B10TSHRTDP1
SCHEMBL6880564 0.76 ALDH1A1 (0.56) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL2117339 0.76 ALDH1A1 (0.71) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL162777 0.75 TSHR (0.53) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL162778 0.75 ESR1 (0.64) LMNATSHRTDP1ESR1L3MBTL1
SCHEMBL161660 0.75 LMNA (0.54) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL15936293 0.74 ALDH1A1 (0.58) LMNAALDH1A1KDM4EHSD17B10TSHR
SCHEMBL600272 0.74 CDC25B (0.58) ALDH1A1KDM4EHSD17B10MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3098653-B1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED BY CURING SAME, METHOD FOR PRODUCING CURED FILM, OPTICAL DEVICE PROVIDED WITH CURED FILM, AND BACKSIDE-ILLUMINATED CMOS IMAGE SENSOR TORAY INDUSTRIES (JP) 2020-07-29 EP disclosed
US-9977329-B2 Negative photosensitive resin composition, cured film obtained by curing same, method for producing cured film, optical device provided with cured film, and backside-illuminated CMOS image sensor TORAY INDUSTRIES, INC. (JP) 2018-05-22 US disclosed
US-20170010532-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED BY CURING SAME, METHOD FOR PRODUCING CURED FILM, OPTICAL DEVICE PROVIDED WITH CURED FILM, AND BACKSIDE-ILLUMINATED CMOS IMAGE SENSOR TORAY INDUSTRIES, INC. (JP) 2017-01-12 US disclosed
EP-3098653-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED BY CURING SAME, METHOD FOR PRODUCING CURED FILM, OPTICAL DEVICE PROVIDED WITH CURED FILM, AND BACKSIDE-ILLUMINATED CMOS IMAGE SENSOR Toray Industries, Inc. (JP) 2016-11-30 EP disclosed