SCHEMBL1826451

SCHEMBL1826451

C=C(C(=O)O)C(C)CC(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1766737 0.79 GABRR1 (0.39)
SCHEMBL11928262 0.78 TET2 (0.34) TET2
SCHEMBL1766733 0.74
SCHEMBL1766391 0.72
SCHEMBL1766393 0.72 EPHX1 (0.30)
SCHEMBL9188920 0.72 THRB (0.33)
SCHEMBL7159105 0.70 ALDH1A1 (0.46) TET2
SCHEMBL20508274 0.69
SCHEMBL791557 0.69
SCHEMBL2877817 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed