Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL433368 | 0.81 | ALDH1A1 (0.31) | — | |
| SCHEMBL8711316 | 0.76 | ALDH1A1 (0.33) | KDM4EPKM | |
| SCHEMBL1825226 | 0.75 | — | — | |
| SCHEMBL28199299 | 0.71 | ALDH1A1 (0.35) | KDM4EPKM | |
| SCHEMBL2519775 | 0.70 | ALDH1A1 (0.34) | KDM4EPKM | |
| SCHEMBL4583441 | 0.70 | ALDH1A1 (0.34) | KDM4EPKM | |
| SCHEMBL1827427 | 0.70 | — | — | |
| Oxalic Acid SCHEMBL28437631 | 0.70 | FFAR3 (0.35) | — | |
| Ethyl Acetate SCHEMBL17840978 | 0.69 | ALDH1A1 (0.64) | KDM4EPKM | |
| SCHEMBL1476337 | 0.69 | SOAT1 (0.32) | KDM4EPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2357521-B1 | Photosensitive conductive film, method of forming a conductive film substrate and method of forming a conductive pattern substrate | HITACHI CHEMICAL CO LTD (JP) | 2016-11-02 | — | — | EP | disclosed |
| US-9161442-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-9119310-B2 | — | — | 2015-08-25 | — | — | US | disclosed |
| US-8840992-B2 | Curable resin composition and optical film | JNC CORPORATION (JP) | 2014-09-23 | — | — | US | disclosed |
| US-20140124253-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-05-08 | — | — | US | disclosed |
| US-8674233-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-03-18 | — | — | US | disclosed |
| EP-2320433-B1 | METHOD OF FORMING A CONDUCTIVE PATTERN | HITACHI CHEMICAL CO LTD (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-8426741-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120138348-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | RESONAC CORPORATION (JP) | 2012-06-07 | — | — | US | disclosed |
| US-8171628-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| EP-2357521-A1 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | Hitachi Chemical Co., Ltd. (JP) | 2011-08-17 | — | — | EP | disclosed |
| US-20110189470-A1 | CURABLE RESIN COMPOSITION AND OPTICAL FILM | CHISSO CORPORATION (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110165514-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | RESONAC CORPORATION (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20110147054-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | RESONAC CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| EP-2320433-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | Hitachi Chemical Company, Ltd. (JP) | 2011-05-11 | — | — | EP | disclosed |