Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 5/20 | 0.45 |
| ▸ | THRA | P10827 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TGM2 | P21980 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | TEAD1 | P28347 | 1/20 | 0.34 |
| ▸ | TEAD3 | Q99594 | 1/20 | 0.34 |
| ▸ | PPARG | P37231 | 3/20 | 0.33 |
| ▸ | PPARA | Q07869 | 2/20 | 0.33 |
| ▸ | AKT1 | P31749 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.33 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28562182 | 0.80 | THRB (0.45) | THRBALDH1A1TGM2CYP2C19CYP3A4 | |
| SCHEMBL13853478 | 0.79 | THRB (0.43) | THRBTHRATGM2CYP2C19CYP2C9 | |
| SCHEMBL8982099 | 0.78 | THRB (0.42) | THRBTHRAALDH1A1TSHRTGM2 | |
| SCHEMBL3407052 | 0.78 | LTA4H (0.39) | ALDH1A1TSHRPPARGPPARANPSR1 | |
| SCHEMBL31390458 | 0.78 | THRB (0.43) | THRBALDH1A1TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL28450603 | 0.78 | THRB (0.46) | THRBALDH1A1TGM2CYP2C19CYP3A4 | |
| SCHEMBL5850749 | 0.78 | THRB (0.46) | THRBALDH1A1TGM2CYP2C19CYP3A4 | |
| SCHEMBL28865353 | 0.77 | THRB (0.43) | THRBTHRAALDH1A1TGM2CYP2C19 | |
| SCHEMBL2768277 | 0.77 | THRB (0.43) | THRBTHRAALDH1A1TGM2CYP2C19 | |
| SCHEMBL6927418 | 0.76 | THRB (0.45) | THRBTHRAALDH1A1TSHRTGM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9080100-B2 | Polymerizable liquid crystal composition | JNC CORPORATION (JP) | 2015-07-14 | — | — | US | claimed |
| US-20140002773-A1 | POLYMERIZABLE LIQUID CRYSTAL COMPOSITION | JNC PETROCHEMICAL CORPORATION (JP) | 2014-01-02 | — | — | US | claimed |
| US-7026371-B2 | Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same | TDK CORPORATION (JP) | 2006-04-11 | — | — | US | claimed |
| EP-3798244-B1 | RESIN COMPOSITION, POLISHING PAD, AND METHOD FOR PRODUCING POLISHING PAD | RESONAC CORP (JP) | 2024-03-06 | — | — | EP | disclosed |
| US-11873399-B2 | Resin composition, polishing pad, and method for producing polishing pad | RESONAC CORPORATION (JP) | 2024-01-16 | — | — | US | disclosed |
| CN-111819211-B | Resin composition, polishing pad, and method for producing polishing pad | 昭和电工株式会社 | 2023-01-24 | — | — | CN | disclosed |
| EP-3798244-A1 | RESIN COMPOSITION, POLISHING PAD, AND METHOD FOR PRODUCING POLISHING PAD | Showa Denko K.K. (JP) | 2021-03-31 | — | — | EP | disclosed |
| US-20210054192-A1 | RESIN COMPOSITION, POLISHING PAD, AND METHOD FOR PRODUCING POLISHING PAD | SHOWA DENKO K.K. (JP) | 2021-02-25 | — | — | US | disclosed |
| CN-111819211-A | Resin composition, polishing pad, and method for producing polishing pad | 昭和电工株式会社 | 2020-10-23 | — | — | CN | disclosed |
| WO-2020021774-A1 | POLISHING PAD | 昭和電工株式会社 | 2020-01-30 | — | — | WO | disclosed |
| US-10059880-B2 | Polymerizable liquid crystal composition and optical anisotropic film | JNC CORPORATION (JP) | 2018-08-28 | — | — | US | disclosed |
| EP-0858725-B1 | MULTILAYER PRINTED CIRCUIT BOARD AND PROCESS FOR PRODUCING THE SAME | SUMITOMO BAKELITE CO (JP) | 2000-07-05 | — | — | EP | disclosed |
| EP-0750230-B1 | Negative type photosensitive compositions | FUJI PHOTO FILM CO LTD (JP) | 1999-02-10 | — | — | EP | disclosed |
| US-5854325-A | Photosensitive adhesive composition for additive plating | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1998-12-29 | — | — | US | disclosed |
| EP-0858725-A1 | MULTILAYER PRINTED CIRCUIT BOARD AND PROCESS FOR PRODUCING THE SAME | Sumitomo Bakelite Company Limited (JP) | 1998-08-19 | — | — | EP | disclosed |
| US-5756190-A | NOVOLAK EPOXY RESIN, CURING AGENT, DILUENT, PHOTOPOLYMERIZATION CATALYST | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1998-05-26 | — | — | US | disclosed |
| US-5726219-A | Resin composition and printed circuit board using the same | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1998-03-10 | — | — | US | disclosed |
| US-5725994-A | CONTAINING AN ACID PRECURSOR AND A HYDROXYL GROUP CONTAINING LINEAR POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-10 | — | — | US | disclosed |
| WO-1997016948-A1 | MULTILAYER PRINTED CIRCUIT BOARD AND PROCESS FOR PRODUCING THE SAME | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1997-05-09 | — | — | WO | disclosed |
| EP-0750230-A2 | Negative type photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-27 | — | — | EP | disclosed |