SCHEMBL18308670

SCHEMBL18308670

Oc1ccc(C(c2ccccc2)(c2ccccc2)c2ccc(O)c3ccccc23)c2ccccc12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 8/20 0.54
▸ EP300 Q09472 2/20 0.43
▸ KAT2B Q92831 2/20 0.43
▸ KAT8 Q9H7Z6 2/20 0.43
▸ HDAC3 O15379 1/20 0.43
▸ NCOR2 Q9Y618 1/20 0.43
▸ CYP1A2 P05177 2/20 0.42
▸ HPGD P15428 2/20 0.42
▸ HSD17B10 Q99714 2/20 0.42
▸ CYP2D6 P10635 1/20 0.42
▸ CYP2C9 P11712 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ HIF1A Q16665 1/20 0.42
▸ LDHA P00338 1/20 0.38
▸ CTSB P07858 1/20 0.37
▸ APP P05067 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ THRB P10828 1/20 0.37
▸ ALOX15 P16050 1/20 0.37
▸ TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL895369 0.82 CYP1A2 (0.58) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL14580918 0.82 CYP2D6 (0.53) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL23861628 0.81 MAPT (0.55) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL23861571 0.81 HSD17B10 (0.45) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL23861353 0.77 HPGD (0.39) IDO1CYP1A2HPGDHSD17B10CYP2D6
SCHEMBL24870978 0.77 CYP1A2 (0.35) CYP1A2HPGDHSD17B10CYP2D6CYP2C9
SCHEMBL23861573 0.76 THRB (0.47) IDO1CYP1A2HPGDHSD17B10CYP2D6
SCHEMBL69219 0.74 IDO1 (0.59) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL6566550 0.74 IDO1 (0.59) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL6399211 0.74 IDO1 (0.59) IDO1EP300KAT2BKAT8HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9589788-B2 Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition SK INNOVATION CO., LTD. (KR) 2017-03-07 — — US disclosed
US-9589788-B2 Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition SK INNOVATION CO., LTD. (KR) 2017-03-07 — — US disclosed
US-20160365242-A1 Novel Polymer with a Good Heat Resistance and Storage Stability, Underlayer Film Composition Containing the Polymer and Process for Forming Underlayer Film Using the Composition SK GEO CENTRIC CO., LTD. (KR) 2016-12-15 — — US disclosed
US-20160365242-A1 Novel Polymer with a Good Heat Resistance and Storage Stability, Underlayer Film Composition Containing the Polymer and Process for Forming Underlayer Film Using the Composition SK GEO CENTRIC CO., LTD. (KR) 2016-12-15 — — US disclosed
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