Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | MEN1 | O00255 | 4/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.54 |
| ▸ | POLB | P06746 | 2/20 | 0.54 |
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | CES2 | O00748 | 1/20 | 0.52 |
| ▸ | CES1 | P23141 | 1/20 | 0.52 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.45 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL28852022 | 1.00 | ALDH1A1 (0.61) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| Water SCHEMBL28198914 | 0.98 | ALDH1A1 (0.59) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| SCHEMBL10014219 | 0.96 | ALDH1A1 (0.61) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| SCHEMBL10446223 | 0.93 | ALDH1A1 (0.54) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| Benzoin SCHEMBL23361761 | 0.92 | LMNA (0.68) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| Acetophenone SCHEMBL25228803 | 0.92 | ALDH1A1 (0.61) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| SCHEMBL10446462 | 0.90 | SRD5A2 (0.59) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| SCHEMBL11514046 | 0.90 | SRD5A2 (0.53) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| SCHEMBL11863284 | 0.88 | NPSR1 (0.62) | ALDH1A1CYP3A4MEN1KMT2APOLB | |
| SCHEMBL10225888 | 0.88 | RECQL (0.52) | ALDH1A1CYP3A4MEN1KMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3628 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4404866-A1 | 3D PRINTING RESIN WITH SEPARATION EFFECT | PRO3DURE MEDICAL GMBH (DE) | 2024-07-31 | — | — | EP | claimed |
| CN-113341647-B | Dry film resist composition and dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-112947001-B | Photosensitive resin composition, dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-117687268-B | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117687268-A | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| CN-116184763-A | Photocurable resin composition and application thereof | 杭州福斯特电子材料有限公司 | 2023-05-30 | — | — | CN | claimed |
| CN-110471256-B | Photosensitive resin composition | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-113801291-B | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| WO-2023046869-A1 | 3D PRINTING RESIN WITH SEPARATION EFFECT | Pro3dure Medical GmbH (DE) | 2023-03-30 | — | — | WO | claimed |
| US-6395429-B1 | MIXTURE OF (METH)ACRYLATED ESTER, POLYALKYLENE GLYCOL (METH)ACRYLATE ETHER, LITHIUM SALT AND CURING AGENTS | SAMSUNG SDI CO., LTD. (KR) | 2002-05-28 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-5855837-A | Thick, composite parts made from photopolymerizable compositions and methods for making such parts | MICHIGAN STATE UNIVERSITY (US) | 1999-01-05 | — | — | US | claimed |
| US-5242782-A | Flexographic printing plate | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1993-09-07 | — | — | US | claimed |
| US-5179067-A | Benzoin derivative sensitizer | CHONJU PAPER MFG. CO., LTD. (KR) | 1993-01-12 | — | — | US | claimed |
| US-4980269-A | FLEXOGRAPHY PRINTING PLATES | NIPPON ZEON CO., LTD. (JP) | 1990-12-25 | — | — | US | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |
| US-4266005-A | Photosensitive elastomeric composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1981-05-05 | — | — | US | claimed |
| US-4048036-A | CURING, PHOTOINITIATOR | PPG INDUSTRIES, INC. (US) | 1977-09-13 | — | — | US | claimed |
| US-4017652-A | Photocatalyst system and ultraviolet light curable coating compositions containing the same | PPG INDUSTRIES, INC. (US) | 1977-04-12 | — | — | US | claimed |