SCHEMBL1831583

SCHEMBL1831583

CCOC(=O)C1=C2CCC(=C1)C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.40
KDM4E B2RXH2 2/20 0.40
ALOX15 P16050 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
HPGD P15428 3/20 0.39
HTT P42858 1/20 0.39
TSHR P16473 1/20 0.39
CA12 O43570 5/20 0.37
CA1 P00915 5/20 0.37
CA2 P00918 5/20 0.37
CA7 P43166 5/20 0.37
CA9 Q16790 5/20 0.37
CA14 Q9ULX7 5/20 0.37
GAA P10253 5/20 0.37
ALDH1A1 P00352 4/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
CYP1A2 P05177 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL819237 0.64 TSHR (0.50) MAPTKDM4EALOX15MEN1KMT2A
SCHEMBL819216 0.64 MAPT (0.42) MAPTKDM4EALOX15MEN1KMT2A
SCHEMBL9548196 0.64 KDM4E (0.72) MAPTKDM4EALOX15MEN1KMT2A
SCHEMBL303623 0.64
SCHEMBL5608026 0.64 KDM4E (0.59) MAPTKDM4EALOX15MEN1KMT2A
SCHEMBL43932 0.63
SCHEMBL9626894 0.63 TSHR (0.48) MAPTKDM4EMEN1KMT2AHPGD
SCHEMBL31196992 0.63 TSHR (0.48) MAPTKDM4EALOX15MEN1KMT2A
SCHEMBL12808756 0.62 MEN1 (0.43) MAPTKDM4EALOX15MEN1KMT2A
SCHEMBL817678 0.62 TSHR (0.43) MAPTKDM4EALOX15MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8039198-B2 Sulfonium salt-containing polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-10-18 US disclosed
EP-2101217-B1 Sulfonium salt-containing polymer, resist compositon, and patterning process SHINETSU CHEMICAL CO (JP) 2011-05-11 EP disclosed
US-20090233223-A1 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
EP-2101217-A1 Sulfonium salt-containing polymer, resist compositon, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed