⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2494003 | 0.72 | — | — | |
| SCHEMBL74391 | 0.58 | — | — | |
| SCHEMBL6474388 | 0.54 | — | — | |
| SCHEMBL1672412 | 0.50 | — | — | |
| SCHEMBL1263126 | 0.50 | — | — | |
| SCHEMBL18131679 | 0.50 | — | — | |
| SCHEMBL1263429 | 0.50 | — | — | |
| SCHEMBL1263456 | 0.50 | — | — | |
| SCHEMBL1263875 | 0.50 | — | — | |
| SCHEMBL1263891 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | claimed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | claimed |
| US-20240191346-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MAT US LLC (US) | 2024-06-13 | — | — | US | claimed |
| CN-118007094-A | Halosilane compounds and compositions and methods for depositing silicon-containing films using the same | 弗萨姆材料美国有限责任公司 | 2024-05-10 | — | — | CN | claimed |
| US-11913112-B2 | Processes for depositing silicon-containing films using halidosilane compounds and compositions | VERSUM MATERIALS US, LLC (US) | 2024-02-27 | — | — | US | claimed |
| EP-4092154-A1 | PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | Versum Materials US, LLC (US) | 2022-11-23 | — | — | EP | claimed |
| US-20220154331-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MATERIALS US, LLC (US) | 2022-05-19 | — | — | US | claimed |
| US-11268190-B2 | Processes for depositing silicon-containing films using halidosilane compounds | VERSUM MATERIALS US, LLC (US) | 2022-03-08 | — | — | US | claimed |
| US-20200032389-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | AIR PRODUCTS AND CHEMICALS, INC. | 2020-01-30 | — | — | US | claimed |
| EP-3310942-A2 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | Versum Materials US, LLC (US) | 2018-04-25 | — | — | EP | claimed |
| WO-2016205196-A2 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-22 | — | — | WO | claimed |
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | disclosed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | disclosed |
| US-20240203730-A1 | METHOD OF FORMING AN EPITAXIAL LAYER | ASM IP HOLDING B.V. (NL) | 2024-06-20 | — | — | US | disclosed |
| US-20240191346-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MAT US LLC (US) | 2024-06-13 | — | — | US | disclosed |
| EP-3310942-A2 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | Versum Materials US, LLC (US) | 2018-04-25 | — | — | EP | disclosed |
| EP-3310942-A2 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | Versum Materials US, LLC (US) | 2018-04-25 | — | — | EP | disclosed |
| WO-2016205196-A3 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-09 | — | — | WO | disclosed |
| WO-2016205196-A2 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-22 | — | — | WO | disclosed |
| WO-2016205196-A2 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-22 | — | — | WO | disclosed |