SCHEMBL2494003

SCHEMBL2494003

[SiH3][SiH2]Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18319601 0.72
SCHEMBL74391 0.67
SCHEMBL23749599 0.55
SCHEMBL8354132 0.55
SCHEMBL317287 0.50
SCHEMBL378744 0.50
SCHEMBL3155709 0.50
SCHEMBL23752072 0.50
SCHEMBL11554337 0.50
SCHEMBL1141165 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP claimed
EP-4667616-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR Hansol Chemical Co., Ltd (KR) 2025-12-24 EP claimed
US-20250369114-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR HANSOL CHEMICAL CO LTD (KR) 2025-12-04 US claimed
EP-4509463-A1 METHOD FOR PRODUCING COMPOUND Yamanaka Hutech Corporation (JP) 2025-02-19 EP claimed
WO-2025018802-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS 주식회사 한솔케미칼 2025-01-23 WO claimed
CN-119013227-A Process for producing compound 山中修科技股份有限公司 2024-11-22 CN claimed
US-20240191346-A1 HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME VERSUM MAT US LLC (US) 2024-06-13 US claimed
CN-118007094-A Halosilane compounds and compositions and methods for depositing silicon-containing films using the same 弗萨姆材料美国有限责任公司 2024-05-10 CN claimed
US-11913112-B2 Processes for depositing silicon-containing films using halidosilane compounds and compositions VERSUM MATERIALS US, LLC (US) 2024-02-27 US claimed
WO-2023200001-A1 METHOD FOR PRODUCING COMPOUND ヤマナカヒューテック株式会社 2023-10-19 WO claimed
EP-4092154-A1 PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME Versum Materials US, LLC (US) 2022-11-23 EP claimed
US-20220154331-A1 HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME VERSUM MATERIALS US, LLC (US) 2022-05-19 US claimed
US-11268190-B2 Processes for depositing silicon-containing films using halidosilane compounds VERSUM MATERIALS US, LLC (US) 2022-03-08 US claimed
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP disclosed
EP-4667616-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR Hansol Chemical Co., Ltd (KR) 2025-12-24 EP disclosed
US-20250369114-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR HANSOL CHEMICAL CO LTD (KR) 2025-12-04 US disclosed
WO-2011123563-A1 CLOSED-LOOP SILICON PRODUCTION Peak Sun Silicon Corporation (US) 2011-10-06 WO disclosed
US-8029756-B1 Closed-loop silicon production Peak Sun Sillcon Corporation (US) 2011-10-04 US disclosed
CN-101133134-B Adhesive compositions comprising mixtures of block copolymers KRATON POLYMERS RES BV 2011-05-11 CN disclosed
CN-101133134-A Adhesive compositions comprising mixtures of block copolymers KRATON POLYMERS RES BV (NL) 2008-02-27 CN disclosed