SCHEMBL18328833

SCHEMBL18328833

C=C(C)C(=O)Oc1ccc(O)c([N+](=O)[O-])c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.46
GPR35 Q9HC97 2/20 0.46
ALDH1A1 P00352 1/20 0.46
TP53 P04637 1/20 0.46
HPGD P15428 1/20 0.46
TSHR P16473 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.45
ALOX15 P16050 1/20 0.45
HSD17B10 Q99714 1/20 0.45
ELANE P08246 1/20 0.43
ALDH5A1 P51649 1/20 0.43
ABAT P80404 1/20 0.43
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
KDM4E B2RXH2 2/20 0.42
MAPT P10636 2/20 0.42
LMNA P02545 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7564089 0.88 GPR35 (0.49) MAPK1GPR35ALDH1A1TP53HPGD
SCHEMBL377595 0.84 MAPK1 (0.51) MAPK1GPR35ALDH1A1TP53HPGD
SCHEMBL18328830 0.83 GPR35 (0.49) MAPK1GPR35ALDH1A1HPGDALOX15
SCHEMBL31097938 0.79 ELANE (0.51) MAPK1ALDH1A1HPGDELANECA12
SCHEMBL10643108 0.79 ELANE (0.51) MAPK1ALDH1A1HPGDELANECA12
SCHEMBL22522294 0.79 MAPT (0.42) ALDH1A1ALOX15HSD17B10ELANEKDM4E
SCHEMBL29269278 0.78 MAPK1 (0.54) MAPK1GPR35ALDH1A1TP53HPGD
SCHEMBL15496033 0.78 ELANE (0.50) MAPK1ALDH1A1HPGDSMN1; SMN2ELANE
SCHEMBL20608269 0.78 ELANE (0.59) MAPK1ALDH1A1HPGDSMN1; SMN2ELANE
SCHEMBL2057240 0.78 SMN1; SMN2 (0.47) MAPK1GPR35ALDH1A1TP53HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9810983-B2 Polymer, chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-07 US disclosed
US-9810983-B2 Polymer, chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-07 US disclosed
US-20160370702-A1 POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-22 US disclosed
US-20160370702-A1 POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-22 US disclosed