Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 8/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 6/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | PPM1B | O75688 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92234 | 0.88 | ALDH1A1 (0.49) | SLC6A3SLC6A4ALDH1A1MEN1KMT2A | |
| SCHEMBL13564252 | 0.87 | SLC6A3 (0.35) | SLC6A3SLC6A4MEN1KMT2APPM1B | |
| SCHEMBL10159628 | 0.80 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL15826724 | 0.79 | ALDH1A1 (0.41) | SLC6A3SLC6A4ALDH1A1MEN1KMT2A | |
| SCHEMBL14884197 | 0.77 | CHRM4 (0.33) | SLC6A3SLC6A4PPM1BPTPN1PPP1CC | |
| SCHEMBL13564254 | 0.77 | SLC6A3 (0.34) | SLC6A3SLC6A4 | |
| SCHEMBL11989211 | 0.76 | SLC6A4 (0.35) | SLC6A3SLC6A4ALDH1A1PPM1BPTPN1 | |
| SCHEMBL15946477 | 0.76 | TSHR (0.34) | SLC6A3SLC6A4ALDH1A1 | |
| SCHEMBL1469984 | 0.76 | ALDH1A1 (0.50) | SLC6A3SLC6A4ALDH1A1 | |
| SCHEMBL9908456 | 0.76 | HMGCR (0.41) | SLC6A3SLC6A4PPM1BPTPN1PPP1CC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |