Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | APOBEC3A | P31941 | 2/20 | 0.43 |
| ▸ | APOBEC3G | Q9HC16 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 4/20 | 0.41 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | KLK7 | P49862 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | LTA4H | P09960 | 1/20 | 0.33 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5289105 | 0.80 | EEF2K (0.40) | NPSR1L3MBTL1KDM4ESMN1; SMN2CALM1 | |
| SCHEMBL29187837 | 0.80 | SMN1; SMN2 (0.42) | APOBEC3AAPOBEC3GKDM4ESMN1; SMN2HDAC8 | |
| SCHEMBL5296926 | 0.79 | CA1 (0.40) | L3MBTL1KDM4ESMN1; SMN2HDAC8CALM1 | |
| SCHEMBL5285505 | 0.79 | LMNA (0.47) | NPSR1L3MBTL1KDM4ESMN1; SMN2CALM1 | |
| SCHEMBL5297071 | 0.79 | CALM1 (0.37) | NPSR1L3MBTL1SMN1; SMN2CALM1LMNA | |
| SCHEMBL5285502 | 0.79 | EEF2K (0.39) | NPSR1L3MBTL1SMN1; SMN2CALM1LMNA | |
| SCHEMBL5297074 | 0.79 | CALM1 (0.37) | NPSR1L3MBTL1KDM4ESMN1; SMN2CALM1 | |
| SCHEMBL5296931 | 0.79 | CA1 (0.48) | KDM4ESMN1; SMN2CALM1LMNATP53 | |
| SCHEMBL5303118 | 0.77 | CALM1 (0.35) | NPSR1L3MBTL1SMN1; SMN2CALM1LMNA | |
| SCHEMBL5303122 | 0.77 | CALM1 (0.35) | CALM1LMNATP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7460357-B2 | Electrolyte for electrolytic capacitor and electrolytic capacitor using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2008-12-02 | — | — | US | claimed |
| US-7072173-B2 | Electrolyte for electrolytic capacitor and electrolytic capacitor using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2006-07-04 | — | — | US | claimed |
| US-20060092597-A1 | Electrolyte for electrolytic capacitor and electrolytic capacitor using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2006-05-04 | — | — | US | claimed |
| US-20040095708-A1 | Electrolyte for electolytic capacitor and electrolytic capacitor using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-05-20 | — | — | US | claimed |
| EP-1394824-A1 | ELECTROLYTIC SOLUTION FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR USING IT | Mitsubishi Chemical Corporation (JP) | 2004-03-03 | — | — | EP | claimed |
| US-12466956-B2 | Electroconductive resin composition and molded article of same | DENKA COMPANY LIMITED (JP) | 2025-11-11 | — | — | US | disclosed |
| WO-2022009445-A9 | ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED ARTICLE | 三洋化成工業株式会社 | 2025-01-16 | — | — | WO | disclosed |
| EP-4159824-B1 | ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED PRODUCT | SANYO CHEMICAL IND LTD (JP) | 2025-01-01 | — | — | EP | disclosed |
| CN-115768850-B | Antistatic agent, antistatic resin composition and molded article | 三洋化成工业株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-115698220-B | Antistatic agent, antistatic resin composition and molded article | 三洋化成工业株式会社 | 2024-05-07 | — | — | CN | disclosed |
| EP-4137625-B1 | ANTISTATIC AGENT | SANYO CHEMICAL IND LTD (JP) | 2024-03-27 | — | — | EP | disclosed |
| US-20230323001-A1 | ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED ARTICLE | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2023-10-12 | — | — | US | disclosed |
| US-20060092597-A1 | Electrolyte for electrolytic capacitor and electrolytic capacitor using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2006-05-04 | — | — | US | disclosed |
| EP-1628334-A1 | POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD | SANYO CHEMICAL INDUSTRIES LTD. (JP) | 2006-02-22 | — | — | EP | disclosed |
| US-20060007629-A1 | Electrolyte for electrolytic capacitor, electrolytic capacitor and process for producing tetrafluoroaluminate salt of organic onium | MITSUBISHI CHEMICAL CORPORATION (JP) | 2006-01-12 | — | — | US | disclosed |
| EP-1564768-A1 | ELECTROLYTE FOR ELECTROLYTIC CAPACITOR, ELECTROLYTIC CAPACITOR AND PROCESS FOR PRODUCING TETRAFLUOROALUMINATE SALT OF ORGANIC ONIUM | Mitsubishi Chemical Corporation (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-20050136247-A1 | Non-aqueous absorbent and use thereof | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-23 | — | — | US | disclosed |
| EP-1462460-A1 | NON-AQUEOUS ABSORBENT AND USE THEREOF | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2004-09-29 | — | — | EP | disclosed |
| US-20040095708-A1 | Electrolyte for electolytic capacitor and electrolytic capacitor using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-05-20 | — | — | US | disclosed |
| EP-1394824-A1 | ELECTROLYTIC SOLUTION FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR USING IT | Mitsubishi Chemical Corporation (JP) | 2004-03-03 | — | — | EP | disclosed |