SCHEMBL18380950

SCHEMBL18380950

C=C(/C=C\C)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ AKT1 P31749 2/20 0.38
▸ TSHR P16473 1/20 0.38
▸ BCHE P06276 1/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ NFKB1 P19838 1/20 0.38
▸ NFKB2 Q00653 1/20 0.38
▸ RELA Q04206 1/20 0.38
▸ LMNA P02545 3/20 0.38
▸ MAPT P10636 3/20 0.38
▸ MEN1 O00255 2/20 0.38
▸ KMT2A Q03164 2/20 0.38
▸ ATM Q13315 2/20 0.38
▸ NPSR1 Q6W5P4 2/20 0.38
▸ CES2 O00748 1/20 0.38
▸ CES1 P23141 1/20 0.38
▸ XBP1 P17861 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ RECQL P46063 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.36
▸ NPC1 O15118 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1071814 1.00 AKT1 (0.38) AKT1TSHRBCHECYP3A4NFKB1
SCHEMBL1071816 1.00 AKT1 (0.38) AKT1TSHRBCHECYP3A4NFKB1
Bicarbonate SCHEMBL11378162 0.94 AKT1 (0.43) AKT1TSHRBCHECYP3A4NFKB1
SCHEMBL18381166 0.85 MEN1 (0.38) AKT1TSHRBCHECYP3A4NFKB1
SCHEMBL7854362 0.80 AKT1 (0.41) AKT1TSHRLMNAMAPTMEN1
SCHEMBL18532932 0.80 TSHR (0.39) AKT1TSHRBCHECYP3A4NFKB1
SCHEMBL20999220 0.80 MAPT (0.35) AKT1LMNAMAPTMEN1KMT2A
SCHEMBL12087611 0.79 MAPT (0.50) TSHRCYP3A4LMNAMAPTMEN1
SCHEMBL25064743 0.79 MAPT (0.37) AKT1LMNAMAPTMEN1KMT2A
SCHEMBL14792478 0.79 RECQL (0.37) AKT1TSHRCYP3A4NFKB1NFKB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3118684-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2017-01-18 — — EP disclosed
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