Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Bicarbonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL95313 | 1.00 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1 | |
| SCHEMBL28284161 | 0.91 | — | — | |
| Bicarbonate SCHEMBL29117102 | 0.82 | TSHR (0.31) | TSHR | |
| Bicarbonate SCHEMBL1062002 | 0.82 | TSHR (0.31) | TSHR | |
| Bicarbonate SCHEMBL239115 | 0.77 | TSHR (0.32) | ALDH1A1TSHRTDP1 | |
| SCHEMBL29546719 | 0.74 | ALDH1A1 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL12330817 | 0.74 | ALDH1A1 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL12301938 | 0.74 | ALDH1A1 (0.32) | ALDH1A1TSHRTDP1 | |
| SCHEMBL1645934 | 0.74 | TSHR (0.32) | ALDH1A1TSHRTDP1 | |
| Acetic Acid SCHEMBL29199856 | 0.74 | ALDH1A1 (0.40) | ALDH1A1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119923449-A | Adhesive composition, adhesive film, connection structure, and method for producing same | 株式会社力森诺科 | 2025-05-02 | — | — | CN | disclosed |
| CN-119409905-A | Composition and sheet | 株式会社力森诺科 | 2025-02-11 | — | — | CN | disclosed |
| CN-116710508-B | Composition and sheet | 株式会社力森诺科 | 2024-11-15 | — | — | CN | disclosed |
| CN-115916894-B | Curable resin, composition, cured product, varnish, prepreg, and circuit board | DIC株式会社 | 2024-07-26 | — | — | CN | disclosed |
| CN-118284635-A | Photocurable resin composition, fuel cell, and sealing method | 三键有限公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-118259564-A | Toner and method for producing toner | 佳能株式会社 | 2024-06-28 | — | — | CN | disclosed |
| CN-111205788-B | Anisotropic film and method for producing anisotropic film | 信越化学工业株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113166339-B | Curable resin composition, fuel cell, and sealing method | 三键有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-117651730-A | Resin composition and adhesive | 纳美仕有限公司 | 2024-03-05 | — | — | CN | disclosed |
| CN-112585181-B | Curable resin composition and cured product | 三键有限公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-1466598-A | Plastic lens composition, plastic lens and method for producing the plastic lens | �Ѻ͵繤��ʽ���� | 2004-01-07 | — | — | CN | disclosed |
| WO-2003078127-A1 | COMPOSITE FOAMED POLYPROPYLENE RESIN MOLDING AND METHOD OF PRODUCING SAME | JSP CORPORATION (JP) | 2003-09-25 | — | — | WO | disclosed |
| US-20030107465-A1 | Passive element component and substrate with built-in passive element | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-06-12 | — | — | US | disclosed |
| WO-2003037971-A2 | PROCESS OF PRODUCING EXPANDED POLYPROPYLENE RESIN BEADS | JSP CORPORATION (JP) | 2003-05-08 | — | — | WO | disclosed |
| US-6468589-B2 | A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING | JSR CORPORATION (JP) | 2002-10-22 | — | — | US | disclosed |
| WO-2002024794-A9 | EXPANDED POLYPROPYLENE RESIN BEAD | JSP CORP (JP) | 2002-05-10 | — | — | WO | disclosed |
| US-20010012870-A1 | Composition for film formation and insulating film | JSR CORPORATION (JP) | 2001-08-09 | — | — | US | disclosed |
| US-5939465-A | COMPRISING N-HETEROCYCLE COMPOUND, COMPOUND CONTAINING AT LEAST ONE ADDITION-POLYMERIZABLE, ETHYLENICALLY UNSATURATED BOND, AND COMPOUND WHICH GENERATES AN ACTIVE RADICAL UPON IRRADIATION OF LIGHT | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-17 | — | — | US | disclosed |
| US-5362595-A | Blending high and low molecular weight polymers formed by bulk and solution polymerization; fixing at high speed and/or low temperature | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0193006-B1 | METHOD FO PLASMA-INITIATED POLYMERIZATION | TERUMO KABUSHIKI KAISHA trading as TERUMO CORPORATION (JP) | 1989-11-02 | — | — | EP | disclosed |