SCHEMBL184093

SCHEMBL184093

CC(C)CC(C)(O)/C=C/C(C)(O)CC(C)C

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 2/20 0.39
MEN1 O00255 1/20 0.39
CYP3A4 P08684 1/20 0.39
KMT2A Q03164 1/20 0.39
MMP8 P22894 1/20 0.36
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL184094 1.00 ALOX15 (0.39) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL11849474 0.92 MEN1 (0.35) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL11849468 0.92 MEN1 (0.35) ALOX15MEN1CYP3A4KMT2AMMP8
Oxirane SCHEMBL7617062 0.88 MEN1 (0.33) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL12673069 0.87 MEN1 (0.35) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL545025 0.83
SCHEMBL28766033 0.82 TSHR (0.38) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL1782690 0.79 MMP8 (0.37) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL1782689 0.79 MMP8 (0.37) ALOX15MEN1CYP3A4KMT2AMMP8
SCHEMBL28703110 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110048278-A1 INKJET AQUEOUS INK KABUSHIKI KAISHA TOSHIBA (JP) 2011-03-03 US claimed
JP-9241495-A None JP disclosed
CN-115027163-B Alcohol-free fountain solution and preparation method thereof 北京汇林印务有限公司 2023-11-28 CN disclosed
CN-113166420-B Acrylic polymerized polysiloxane, composition containing the same, and cured film using the same 默克专利有限公司 2023-06-23 CN disclosed
CN-113631672-B Positive photosensitive polysiloxane composition 默克专利有限公司 2022-12-13 CN disclosed
CN-111601678-B Flux and solder paste 千住金属工业株式会社 2022-02-25 CN disclosed
CN-114059366-A Treatment liquid composition for inkjet pigment printing, ink set, and recording method 精工爱普生株式会社 2022-02-18 CN disclosed
CN-113845799-A Ink jet ink set for textile printing, ink jet recording method, and ink jet recording apparatus 精工爱普生株式会社 2021-12-28 CN disclosed
CN-113631672-A Positive photosensitive polysiloxane composition 默克专利有限公司 2021-11-09 CN disclosed
CN-113166420-A Acrylic-polymerized polysiloxane, composition containing the same, and cured film using the same 默克专利有限公司 2021-07-23 CN disclosed
US-7081503-B2 Process producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition KANEKA CORPORATION (JP) 2006-07-25 US disclosed
US-7018963-B2 Water-soluble surfactant composition NISSIN CHEMICAL INDUSTRY CO., LTD. (JP) 2006-03-28 US disclosed
US-7009004-B2 Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition KANEKA CORPORATION (JP) 2006-03-07 US disclosed
US-20060004171-A1 Process for producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition TSUJI RYOTARO 2006-01-05 US disclosed
US-20050004261-A1 Aqueous ink composition and method of manufacturing the same SEIKO EPSON CORPORATION 2005-01-06 US disclosed
US-20040242447-A1 Water-soluble surfactant composition NISSIN CHEMICAL INDUSTRY CO., LTD. (JP) 2004-12-02 US disclosed
US-6075060-A USEFUL IN LOWERING THE EQUILIBRIUM SURFACE TENSION OF AQUEOUS ORGANIC COMPOSITIONS, FOR EXAMPLE, THOSE USED IN COATINGS, INKS AND ADHESIVES AIR PRODUCTS AND CHEMICALS, INC. (US) 2000-06-13 US disclosed
EP-0940169-A1 Trans olefinic diols with surfactant properties AIR PRODUCTS AND CHEMICALS, INC. (US) 1999-09-08 EP disclosed
JP-H09241495-A RESIN COMPOSITION FOR MOLDING AND PRODUCTION OF FIBER-REINFORCED PLASTIC MOLDED PRODUCT HITACHI CHEM CO LTD 1997-09-16 JP disclosed
US-3975381-A Process for preparing γ-lactone derivatives SAGAMI CHEMICAL RESEARCH CENTER (JA) 1976-08-17 US disclosed