SCHEMBL18455463

SCHEMBL18455463

C=C(C)C(=O)OC1CC2C[C@H]1CC21CCOC1=O

nearest known ligand 0.40

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
GPX4 P36969 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75160 1.00 GPX4 (0.31) GPX4
SCHEMBL18714039 0.81 CHRM2 (0.34)
SCHEMBL18785964 0.81 SMN1; SMN2 (0.32)
SCHEMBL13481211 0.79
SCHEMBL6367325 0.79 HMGCR (0.35)
SCHEMBL6835312 0.78
SCHEMBL19335816 0.77
SCHEMBL21281770 0.77 ALDH1A1 (0.30) GPX4
SCHEMBL12269891 0.75 GPX4 (0.32) GPX4
SCHEMBL13360980 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10005868-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-20170029547-A1 RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-02-02 US disclosed