SCHEMBL1846381

SCHEMBL1846381

C/C=C/C(=O)OCc1cccc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ EPHX1 P07099 1/20 0.48
▸ ATM Q13315 1/20 0.47
▸ TDP1 Q9NUW8 2/20 0.46
▸ KMT2A Q03164 3/20 0.46
▸ MEN1 O00255 2/20 0.46
▸ PARP10 Q53GL7 2/20 0.46
▸ SLC1A3 P43003 1/20 0.45
▸ SLC1A2 P43004 1/20 0.45
▸ SLC1A1 P43005 1/20 0.45
▸ FFAR1 O14842 1/20 0.43
▸ AKR1B1 P15121 1/20 0.43
▸ L3MBTL1 Q9Y468 2/20 0.43
▸ NPC1 O15118 1/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ MAPK8 P45983 1/20 0.42
▸ MAPK9 P45984 1/20 0.42
▸ MAPK10 P53779 1/20 0.42
▸ PARP15 Q460N3 1/20 0.41
▸ ACP3 P15309 1/20 0.41
▸ MTNR1A P48039 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1846382 1.00 EPHX1 (0.48) EPHX1ATMTDP1KMT2AMEN1
SCHEMBL2639202 0.91 EPHX1 (0.52) EPHX1ATMTDP1KMT2AMEN1
SCHEMBL2639206 0.91 EPHX1 (0.52) EPHX1ATMTDP1KMT2AMEN1
Ammonia Solution, Strong SCHEMBL5952473 0.89 PARP10 (0.45) EPHX1ATMTDP1KMT2AMEN1
SCHEMBL1844660 0.87 MTNR1A (0.42) KMT2AMEN1PARP10NPC1RAB9A
SCHEMBL1844658 0.87 MTNR1A (0.42) KMT2AMEN1PARP10NPC1RAB9A
SCHEMBL29484778 0.81 MEN1 (0.51) EPHX1ATMTDP1KMT2AMEN1
SCHEMBL2167443 0.81 MEN1 (0.51) EPHX1ATMTDP1KMT2AMEN1
SCHEMBL5176891 0.80 IDO1 (0.46) AKR1B1
SCHEMBL14937098 0.80 MAOB (0.45) KMT2AAKR1B1L3MBTL1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1905787-B1 Lithographic printing plate precursor using a polymer latex of high acrylonitrile content FUJIFILM CORP (JP) 2011-05-18 — — EP disclosed
US-7745076-B2 Dye-containing curable composition, color filter, and producing process thereof FUJIFILM CORPORATION (JP) 2010-06-29 — — US disclosed
US-20080281058-A1 PROCESS FOR PRODUCING ACRYLONITRILE-CONTAINING POLYMER LATEX FUJIFILM CORPORATION (JP) 2008-11-13 — — US disclosed
US-20080176151-A1 DYE-CONTAINING CURABLE COMPOSITION, COLOR FILTER, AND PRODUCING PROCESS THEREOF FUJIFILM CORPORATION 2008-07-24 — — US disclosed
EP-1935910-A2 Process for producing acrylonitrile-containing polymer latex FUJIFILM Corporation (JP) 2008-06-25 — — EP disclosed
US-20080096132-A1 mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and an alkali metal persulfate polymerization initiator to conduct emulsion polymerization; distilling off unpolymerized monomers; chemical resistance film, gas barrier FUJIFILM CORPORATION 2008-04-24 — — US disclosed
US-7358033-B2 Dye-containing curable composition, color filter, and producing process thereof FUJIFILM CORPORATION (JP) 2008-04-15 — — US disclosed
EP-1905787-A2 Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex FUJIFILM Corporation (JP) 2008-04-02 — — EP disclosed
US-20030232259-A1 Dye-containing curable composition, color filter, and producing process thereof FUJI PHOTO FILM CO., LTD. 2003-12-18 — — US disclosed
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