SCHEMBL2167443

SCHEMBL2167443

C=CC(=O)OCc1cccc2ccccc12

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.51
KMT2A Q03164 4/20 0.51
EPHX1 P07099 1/20 0.50
TGM2 P21980 2/20 0.49
TDP1 Q9NUW8 1/20 0.49
PARP10 Q53GL7 1/20 0.48
SLC1A3 P43003 1/20 0.47
SLC1A2 P43004 1/20 0.47
SLC1A1 P43005 1/20 0.47
F13A1 P00488 1/20 0.46
TGM1 P22735 1/20 0.46
ATM Q13315 1/20 0.46
FFAR1 O14842 1/20 0.45
AKR1B1 P15121 1/20 0.45
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
THRB P10828 1/20 0.44
ACP3 P15309 1/20 0.44
CYP1A2 P05177 1/20 0.43
KDM4E B2RXH2 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29484778 1.00 MEN1 (0.51) MEN1KMT2AEPHX1TGM2TDP1
SCHEMBL29503663 0.91 MEN1 (0.44) MEN1KMT2AEPHX1TGM2TDP1
SCHEMBL27421526 0.90 THRB (0.45) MEN1KMT2AEPHX1TGM2PARP10
SCHEMBL29503715 0.88 PPARG (0.51) MEN1KMT2AEPHX1TGM2TDP1
SCHEMBL2639206 0.87 EPHX1 (0.52) MEN1KMT2AEPHX1TDP1PARP10
SCHEMBL2639202 0.87 EPHX1 (0.52) MEN1KMT2AEPHX1TDP1PARP10
SCHEMBL22722205 0.86 CDYL (0.50) MEN1KMT2AEPHX1TGM2TDP1
SCHEMBL216101 0.86 THRB (0.44) MEN1KMT2AEPHX1TGM2TDP1
SCHEMBL29384579 0.84 THRB (0.53) MEN1KMT2ATDP1SLC1A3SLC1A2
SCHEMBL68668 0.84 THRB (0.53) MEN1KMT2ATDP1SLC1A3SLC1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250243389-A1 COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP E INK CORPORATION 2025-07-31 US claimed
US-8536270-B2 Resist composition, resist layer, imprinting method, pattern formation, method for producing magnetic recording medium, and magnetic recording medium FUJIFILM (JP) 2013-09-17 US claimed
EP-4749682-A1 CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE Canon Kabushiki Kaisha (JP) 2026-05-27 EP disclosed
CN-122071546-A Curable composition, film forming method, and method for producing product 佳能株式会社 2026-05-22 CN disclosed
US-20260140445-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE CANON KK (JP) 2026-05-21 US disclosed
US-12629718-B2 Film forming method and article manufacturing method CANON KABUSHIKI KAISHA (JP) 2026-05-19 US disclosed
US-20260126725-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE CANON KK (JP) 2026-05-07 US disclosed
EP-4738008-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE Canon Kabushiki Kaisha (JP) 2026-05-06 EP disclosed
US-20260117010-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2026-04-30 US disclosed
US-20260077385-A1 FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2026-03-19 US disclosed
US-20250376606-A1 COMPOUND, ADDITIVE, PLASTICIZER, CURABLE COMPOSITION, ADHESIVE, CURED PRODUCT, AND PRESSURE-SENSITIVE ADHESIVE MITSUI CHEMICALS INC (JP) 2025-12-11 US disclosed
US-20100010148-A1 AQUEOUS PIGMENT DISPERSION, METHOD FOR PRODUCING THE SAME, AND RECORDING LIQUID CONTAINING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2010-01-14 US disclosed
US-20090283937-A1 CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2009-11-19 US disclosed
US-20090283937-A1 CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2009-11-19 US disclosed
WO-2007110387-A1 PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS SEEREAL TECHNOLOGIES S.A. (DE) 2007-10-04 WO disclosed
EP-1840652-A1 Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics SeeReal Technologies S.A. (LU) 2007-10-03 EP disclosed
US-6753125-B2 SUCH AS A 1-NAPHTHALENEMETHYL ACRYLATE COPOLYMER; PHOTORESIST WITH RESISTANCE TO DRY ETCHING; FOR PHOTOLITHOGRAPHY SAMSUNG ELECTRONICS, CO. LTD (KR) 2004-06-22 US disclosed
US-6465588-B1 PARTICULARLY SUITABLE FOR FOLDABLE INTRAOCULAR LENS SANTEN PHARMACEUTICAL CO., LTD. (JP) 2002-10-15 US disclosed
US-20020076641-A1 Photosensitive polymer having fused aromatic ring and photoresist composition containing the same SAMSUNG ELECTRONICS CO., LTD. 2002-06-20 US disclosed
EP-1026182-A1 FOUR COMPONENT COPOLYMER AND THE OCULAR LENS MADE THEREOF SANTEN PHARMACEUTICAL CO., LTD (JP) 2000-08-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260077385-A1 FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD EEF1D, RHOA, YWHAH MEN1 748/4885KMT2A 1496/4885EPHX1 2970/4885
US-20260126725-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE ATM, ATR, PIEZO1 MEN1 111/4885KMT2A 1269/4885EPHX1 4249/4885
US-12629718-B2 Film forming method and article manufacturing method AUP1, VCL, RHOA MEN1 2357/4885KMT2A 2710/4885EPHX1 3084/4885
US-20260117010-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CCT4, ATM, CCT7 MEN1 416/4885KMT2A 2960/4885EPHX1 3698/4885
US-20250376606-A1 COMPOUND, ADDITIVE, PLASTICIZER, CURABLE COMPOSITION, ADHESIVE, CURED PRODUCT, AND PRESSURE-SENSITIVE ADHESIVE COL1A1, COL2A1, COL14A1 MEN1 3833/4885KMT2A 971/4885EPHX1 264/4885
US-20260140445-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE CFL1, ATM, PSPC1 MEN1 116/4885KMT2A 2108/4885EPHX1 4682/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.