⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2876134 | 0.84 | — | — | |
| SCHEMBL12013287 | 0.81 | TSHR (0.36) | — | |
| SCHEMBL13515830 | 0.79 | — | — | |
| SCHEMBL14818198 | 0.78 | MAPT (0.30) | — | |
| SCHEMBL15083673 | 0.78 | — | — | |
| SCHEMBL14888033 | 0.78 | PRKCA (0.34) | — | |
| SCHEMBL15083675 | 0.78 | — | — | |
| SCHEMBL10292464 | 0.77 | — | — | |
| SCHEMBL14828496 | 0.77 | — | — | |
| SCHEMBL9610770 | 0.76 | MMP8 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11550218-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-10 | — | — | US | disclosed |
| US-20210311392-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-10-07 | — | — | US | disclosed |
| US-10571805-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-25 | — | — | US | disclosed |
| US-9562032-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |