Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.37 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.36 |
| ▸ | APP | P05067 | 1/20 | 0.34 |
| ▸ | IDO1 | P14902 | 2/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.31 |
| ▸ | RXRA | P19793 | 1/20 | 0.31 |
| ▸ | RXRB | P28702 | 1/20 | 0.31 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.30 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18574373 | 0.85 | APP (0.36) | ESR1ESR2PTPN2PTPN1PTPN6 | |
| SCHEMBL8251933 | 0.80 | APP (0.50) | APPCHRM3TSHRNPC1RAB9A | |
| SCHEMBL18911061 | 0.78 | ESR1 (0.41) | ESR1ESR2PTPN2PTPN1PTPN6 | |
| SCHEMBL18911060 | 0.77 | ESR1 (0.39) | ESR1ESR2PTPN2PTPN1PTPN6 | |
| SCHEMBL133476 | 0.77 | TSHR (0.48) | IDO1TSHR | |
| SCHEMBL10534245 | 0.76 | APP (0.35) | ESR1ESR2PTPN2PTPN1PTPN6 | |
| SCHEMBL25031380 | 0.75 | LPL (0.41) | ESR1ESR2NPC1RAB9A | |
| SCHEMBL3434078 | 0.75 | IDO1 (0.59) | PTPN2PTPN1PTPN6IDO1 | |
| SCHEMBL8750541 | 0.74 | SHBG (0.55) | ESR1ESR2PTPN2PTPN1PTPN6 | |
| SCHEMBL10233171 | 0.73 | TSHR (0.46) | TSHRNPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170059990-A1 | RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, MASK BLANK, RESIST PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |