⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18488293 | 0.87 | CYP3A4 (0.32) | — | |
| SCHEMBL17974517 | 0.80 | ABCB11 (0.30) | — | |
| SCHEMBL21134748 | 0.74 | EPHX1 (0.40) | — | |
| SCHEMBL13446130 | 0.72 | CYP19A1 (0.36) | — | |
| SCHEMBL12826387 | 0.72 | CYP19A1 (0.36) | — | |
| SCHEMBL21043003 | 0.70 | CYP19A1 (0.34) | — | |
| SCHEMBL18068542 | 0.70 | — | — | |
| SCHEMBL12460124 | 0.69 | CYP19A1 (0.42) | — | |
| SCHEMBL19696740 | 0.69 | ABCB11 (0.30) | — | |
| SCHEMBL19901932 | 0.69 | CYP19A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10261417-B2 | Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| US-20170038685-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |