SCHEMBL19901932

SCHEMBL19901932

CC(C)CC(C)(C(=O)OC(C)(C)OC1CCCCC1)C(C)C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.31
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12460124 0.83 CYP19A1 (0.42) CYP19A1EPHX1
SCHEMBL12334354 0.79 EPHX1 (0.31) EPHX1
SCHEMBL23015550 0.78 CYP19A1 (0.33) CYP19A1EPHX1
SCHEMBL19901928 0.76
SCHEMBL23015549 0.76
SCHEMBL19017795 0.75 MMP8 (0.31)
SCHEMBL15945478 0.75 EPHX1 (0.38) CYP19A1EPHX1
SCHEMBL23015556 0.75 EPHX1 (0.32) EPHX1
SCHEMBL19901935 0.75 MMP1 (0.30) EPHX1
SCHEMBL18488293 0.74 CYP3A4 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904168-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed