Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3095028 | 0.86 | TSHR (0.43) | TSHRHPGD | |
| SCHEMBL10412807 | 0.83 | TSHR (0.44) | TSHRHPGD | |
| SCHEMBL561301 | 0.81 | TSHR (0.45) | TSHRHPGD | |
| SCHEMBL30921626 | 0.81 | TSHR (0.41) | TSHRHPGD | |
| SCHEMBL2830959 | 0.81 | TSHR (0.40) | TSHRHPGD | |
| SCHEMBL28562465 | 0.80 | TSHR (0.34) | TSHRHPGD | |
| SCHEMBL28217248 | 0.79 | TSHR (0.33) | TSHR | |
| SCHEMBL8024857 | 0.79 | TSHR (0.36) | TSHR | |
| SCHEMBL3669386 | 0.78 | TSHR (0.38) | TSHRHPGD | |
| SCHEMBL28979328 | 0.77 | TSHR (0.33) | TSHRHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11891472-B2 | Composition, production method for composition, and production method for unsaturated compound | RESONAC CORPORATION (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-3842417-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | RESONAC CORP (JP) | 2024-01-24 | — | — | EP | disclosed |
| CN-116583498-A | Blocked isocyanate compound | 株式会社力森诺科 | 2023-08-11 | — | — | CN | disclosed |
| US-11661474-B2 | Composition, production method for composition, and production method for unsaturated compound | SHOWA DENKO K.K. (JP) | 2023-05-30 | — | — | US | disclosed |
| EP-3842414-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO KK (JP) | 2023-04-05 | — | — | EP | disclosed |
| CN-112533896-B | Composition, method for producing composition, and method for producing unsaturated compound | 昭和电工株式会社 | 2023-03-03 | — | — | CN | disclosed |
| EP-3842416-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO KK (JP) | 2023-03-01 | — | — | EP | disclosed |
| CN-112533895-B | Composition, method for producing composition, and method for producing unsaturated compound | 昭和电工株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-114929668-A | (meth) acrylate compound having isocyanate group and method for producing same | 昭和电工株式会社 | 2022-08-19 | — | — | CN | disclosed |
| US-20220119585-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO K.K. (JP) | 2022-04-21 | — | — | US | disclosed |
| CN-102666618-A | Metal-crosslinked organopolysiloxane thio-block vinyl copolymer and antifouling coating composition comprising same | CHUGOKU MARINE PAINTS | 2012-09-12 | — | — | CN | disclosed |
| US-20120205234-A1 | POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION | SHOWA DENKO K.K. (JP) | 2012-08-16 | — | — | US | disclosed |
| CN-101506252-B | Thiourethane compound and photosensitive resin composition | SHOWA DENKO KK | 2011-06-15 | — | — | CN | disclosed |
| US-20110137066-A1 | PROCESS OF INHIBITING POLYMERIZATION OF ISOCYANATE GROUP-CONTAINING, ETHYLENICALLY UNSATURATED CARBOXYLATE COMPOUNDS, AND PROCESS FOR PRODUCING THE COMPOUNDS | SHOWA DENKO K.K. (JP) | 2011-06-09 | — | — | US | disclosed |
| EP-2325166-A1 | METHOD FOR INHIBITING POLYMERIZATION OF ETHYLENICALLY UNSATURATED CARBOXYLIC ACID ESTER COMPOUND CONTAINING ISOCYANATE GROUP AND METHOD FOR PRODUCING ETHYLENICALLY UNSATURATED CARBOXYLIC ACID ESTER COMPOUND CONTAINING ISOCYANATE GROUP | Showa Denko K.K. (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20100233596-A1 | THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | SHOWA DENKO K.K. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100099827-A1 | POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION | SHOWA DENKO K.K. (JP) | 2010-04-22 | — | — | US | disclosed |
| CN-101547955-A | Polymerizable monomer composition and method for preventing polymerization | SHOWA DENKO KK (JP) | 2009-09-30 | — | — | CN | disclosed |
| CN-101506252-A | Thiourethane compound and photosensitive resin composition | SHOWA DENKO KK (JP) | 2009-08-12 | — | — | CN | disclosed |
| EP-2055726-A1 | THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Showa Denko K.K. (JP) | 2009-05-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11661474-B2 | Composition, production method for composition, and production method for unsaturated compound | ELOVL1, ACOX1, NCOA1 | TSHR 3345/4885HPGD 775/4885 |
| US-20110137066-A1 | PROCESS OF INHIBITING POLYMERIZATION OF ISOCYANATE GROUP-CONTAINING, ETHYLENICALLY UNSATURATED CARBOXYLATE COMPOUNDS, AND PROCESS FOR PRODUCING THE COMPOUNDS | ALKBH3, OGDH, IDH2 | TSHR 4884/4885HPGD 244/4885 |
| US-20100233596-A1 | THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | RCOR3, CBR3, TAS2R3 | TSHR 3601/4885HPGD 834/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.