SCHEMBL18544149

SCHEMBL18544149

CCN=C(C)C(O)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18544148 1.00
SCHEMBL16819068 0.76
SCHEMBL16819067 0.76
SCHEMBL16850415 0.74
SCHEMBL11677790 0.74 ALDH1A1 (0.32)
SCHEMBL18544138 0.74
SCHEMBL18544137 0.74
SCHEMBL11677787 0.74 ALDH1A1 (0.32)
SCHEMBL18814274 0.72 NOS1 (0.40)
SCHEMBL13931347 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12559839-B2 Indium compound, thin-film forming raw material, thin film, and method of producing same ADEKA CORPORATION (JP) 2026-02-24 US disclosed
US-20240060177-A1 INDIUM COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN FILM, AND METHOD OF PRODUCING SAME ADEKA CORPORATION (JP) 2024-02-22 US disclosed
WO-2022118834-A1 INDIUM COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, THIN FILM, AND METHOD FOR PRODUCING SAME 株式会社ADEKA 2022-06-09 WO disclosed
US-20200148706-A1 METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING RAW MATERIAL AND METHOD OF PRODUCING THIN FILM ADEKA CORPORATION (JP) 2020-05-14 US disclosed
US-20200148706-A1 METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING RAW MATERIAL AND METHOD OF PRODUCING THIN FILM ADEKA CORPORATION (JP) 2020-05-14 US disclosed
EP-3643700-A1 METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM Adeka Corporation (JP) 2020-04-29 EP disclosed
CN-110709381-A Metal alkoxide compound, thin film-forming material, and method for producing thin film 株式会社ADEKA 2020-01-17 CN disclosed
EP-3135664-B1 ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND ADEKA CORP (JP) 2019-10-23 EP disclosed
EP-3135664-B1 ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND ADEKA CORP (JP) 2019-10-23 EP disclosed
US-10351584-B2 Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound ADEKA CORPORATION (JP) 2019-07-16 US disclosed
US-10351584-B2 Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound ADEKA CORPORATION (JP) 2019-07-16 US disclosed
US-20170121358-A1 ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND ALCOHOL COMPOUND ADEKA CORPORATION (JP) 2017-05-04 US disclosed
US-20170121358-A1 ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND ALCOHOL COMPOUND ADEKA CORPORATION (JP) 2017-05-04 US disclosed
US-20170121358-A1 ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND ALCOHOL COMPOUND ADEKA CORPORATION (JP) 2017-05-04 US disclosed
EP-3135664-A1 ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND Adeka Corporation (JP) 2017-03-01 EP disclosed