SCHEMBL18545828

SCHEMBL18545828

Cc1ccc2c(c1)c(=O)c1ccc(-c3ccc4c(=O)c5ccccc5n(C)c4c3)cc1n2C

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 6/20 0.60
NPC1 O15118 5/20 0.60
RAB9A P51151 5/20 0.60
ATM Q13315 1/20 0.57
RXFP1 Q9HBX9 3/20 0.57
GAA P10253 2/20 0.57
POLB P06746 2/20 0.57
PKM P14618 1/20 0.54
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
NTRK1 P04629 1/20 0.49
TLR9 Q9NR96 1/20 0.49
RXRA P19793 1/20 0.49
RXRB P28702 1/20 0.49
MARK4 Q96L34 2/20 0.47
HCRTR1 O43613 2/20 0.47
ALDH1A1 P00352 2/20 0.45
KDM4E B2RXH2 1/20 0.45
GLA P06280 1/20 0.45
HPGD P15428 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12692761 0.91 ATM (0.58) L3MBTL1NPC1RAB9AATMRXFP1
SCHEMBL19055418 0.89 L3MBTL1 (0.64) L3MBTL1NPC1RAB9AATMRXFP1
SCHEMBL2756511 0.86 ATM (0.51) L3MBTL1NPC1RAB9AATMPKM
SCHEMBL21166970 0.85 L3MBTL1 (0.63) L3MBTL1NPC1RAB9AATMRXFP1
SCHEMBL13412890 0.82 KDM4E (0.49) L3MBTL1NPC1RAB9AATMPOLB
SCHEMBL30858723 0.82 KDM4E (0.51) L3MBTL1NPC1RAB9AATMPOLB
SCHEMBL26506582 0.82 KDM4E (0.51) L3MBTL1NPC1RAB9AATMPOLB
SCHEMBL20987444 0.82 ATM (0.56) L3MBTL1NPC1RAB9AATMRXFP1
SCHEMBL6152156 0.81 ATM (0.55) L3MBTL1NPC1RAB9AATMRXFP1
SCHEMBL20312571 0.81 RXRA (0.60) L3MBTL1NPC1RAB9AATMRXFP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-07-10 US disclosed
US-9971247-B2 Pattern-forming method OSAKA UNIVERSITY (JP) 2018-05-15 US disclosed
US-20170131633-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed
US-20170052448-A1 RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL OSAKA UNIVERSITY (JP) 2017-02-23 US disclosed
US-20170052450-A1 PATTERN-FORMING METHOD OSAKA UNIVERSITY (JP) 2017-02-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method SLC11A2, XRCC5, RAD54L L3MBTL1 4063/4885NPC1 3864/4885RAB9A 1988/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.