SCHEMBL18545875

SCHEMBL18545875

COc1ccc2cc(C(=O)Oc3ccc4c(OC)c(C(=O)O)ccc4c3)ccc2c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.55
KMT2A Q03164 6/20 0.48
MEN1 O00255 5/20 0.48
CASP3 P42574 1/20 0.48
SENP8 Q96LD8 1/20 0.48
SENP7 Q9BQF6 1/20 0.48
SENP6 Q9GZR1 1/20 0.48
ALDH1A1 P00352 3/20 0.45
HPGD P15428 3/20 0.45
HSD17B10 Q99714 2/20 0.45
CYP1A2 P05177 1/20 0.45
CYP2C19 P33261 1/20 0.45
HGFAC Q04756 1/20 0.44
MAPT P10636 2/20 0.43
TDP1 Q9NUW8 1/20 0.43
GBA1 P04062 1/20 0.43
F12 P00748 3/20 0.43
AKR1C3 P42330 2/20 0.42
AKR1C2 P52895 2/20 0.42
ESR1 P03372 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18546032 0.93 KDM4E (0.55) KDM4EKMT2AMEN1CASP3SENP8
SCHEMBL9184742 0.79 ALDH1A1 (0.53) KDM4EALDH1A1HPGDHSD17B10CYP1A2
SCHEMBL9178555 0.78 KDM4E (0.55) KDM4EALDH1A1HPGDHSD17B10MAPT
SCHEMBL14579680 0.77 KDM4E (0.60) KDM4EKMT2AMEN1CASP3SENP8
SCHEMBL25405389 0.76 KMT2A (0.57) KDM4EKMT2AMEN1CASP3SENP8
SCHEMBL30306345 0.76 KMT2A (0.57) KDM4EKMT2AMEN1CASP3SENP8
SCHEMBL8764974 0.76 PTPN1 (0.50) KDM4EKMT2AMEN1ALDH1A1HPGD
SCHEMBL15374827 0.74 LMNA (0.61) KDM4EKMT2AMEN1CASP3SENP8
SCHEMBL12608605 0.74 GBA1 (0.68) KDM4EKMT2AMEN1CASP3SENP8
SCHEMBL5698842 0.74 KDM4E (0.65) KDM4EKMT2AMEN1CASP3SENP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-07-10 US disclosed
US-9971247-B2 Pattern-forming method OSAKA UNIVERSITY (JP) 2018-05-15 US disclosed
US-20170131633-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed
US-20170052450-A1 PATTERN-FORMING METHOD OSAKA UNIVERSITY (JP) 2017-02-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method SLC11A2, XRCC5, RAD54L KDM4E 4396/4885KMT2A 1432/4885MEN1 455/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.