SCHEMBL1859536

SCHEMBL1859536

CCOC(=O)CC1COC(C)(C)O1

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CTDSP1 Q9GZU7 1/20 0.45
CA2 P00918 2/20 0.44
ALDH1A1 P00352 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
SIGMAR1 Q99720 3/20 0.39
TMEM97 Q5BJF2 2/20 0.39
KMT2A Q03164 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
MIF P14174 1/20 0.38
GAA P10253 2/20 0.36
MGAM O43451 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ALOX15 P16050 1/20 0.36
KCNH2 Q12809 1/20 0.35
GRIN2B Q13224 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10314726 1.00 CTDSP1 (0.45) CTDSP1CA2ALDH1A1NPSR1SIGMAR1
SCHEMBL10314728 1.00 CTDSP1 (0.45) CTDSP1CA2ALDH1A1NPSR1SIGMAR1
SCHEMBL8257934 0.88 CTDSP1 (0.41) CTDSP1CA2ALDH1A1NPSR1SIGMAR1
SCHEMBL1243777 0.84 CTDSP1 (0.43) CTDSP1CA2ALDH1A1NPSR1SIGMAR1
SCHEMBL14307904 0.84 KCNH2 (0.38) CTDSP1ALDH1A1SIGMAR1KMT2AL3MBTL1
SCHEMBL18817554 0.84 CTDSP1 (0.43) CTDSP1CA2ALDH1A1NPSR1SIGMAR1
SCHEMBL16454012 0.84 CA2 (0.42) CTDSP1CA2ALDH1A1NPSR1SIGMAR1
SCHEMBL4526320 0.83 CA2 (0.46) CA2ALDH1A1NPSR1SIGMAR1TMEM97
SCHEMBL4528384 0.83 CA2 (0.46) CA2ALDH1A1NPSR1SIGMAR1TMEM97
SCHEMBL5630719 0.81 CTDSP1 (0.44) CTDSP1ALDH1A1SIGMAR1TMEM97MIF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7939243-B2 Resin, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-10 US disclosed
US-20100159389-A1 RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-06-24 US disclosed