SCHEMBL18601329

SCHEMBL18601329

C1COC(CNCC2CO2)C1

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.49
ANPEP P15144 1/20 0.49
HPGD P15428 3/20 0.47
USP2 O75604 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
PKM P14618 1/20 0.46
TP53 P04637 1/20 0.46
ALOX12 P18054 1/20 0.46
ALDH1A1 P00352 2/20 0.45
KDM4E B2RXH2 1/20 0.45
LMNA P02545 1/20 0.45
MEN1 O00255 1/20 0.44
ATM Q13315 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL611743 0.93 KMT2A (0.53) KMT2AANPEPHPGDUSP2SMN1; SMN2
SCHEMBL17376511 0.84 HPGD (0.54) KMT2AANPEPHPGDUSP2SMN1; SMN2
SCHEMBL509597 0.80
SCHEMBL2448784 0.80
SCHEMBL6467984 0.80
SCHEMBL5626593 0.80
SCHEMBL8247969 0.80
SCHEMBL15671149 0.80 USP2 (0.50) KMT2AANPEPHPGDUSP2SMN1; SMN2
SCHEMBL17480336 0.80
SCHEMBL131519 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10633755-B2 Copper plating bath composition and method for deposition of copper ATOTECH DEUTSCHLAND GMBH (DE) 2020-04-28 US claimed
US-20180237932-A1 COPPER PLATING BATH COMPOSITION AND METHOD FOR DEPOSITION OF COPPER ATOTECH USA, LLC 2018-08-23 US claimed
EP-3141633-B1 COPPER PLATING BATH COMPOSITION ATOTECH DEUTSCHLAND GMBH (DE) 2018-05-02 EP claimed
EP-3141633-A1 COPPER PLATING BATH COMPOSITION ATOTECH Deutschland GmbH (DE) 2017-03-15 EP claimed
US-10633755-B2 Copper plating bath composition and method for deposition of copper ATOTECH DEUTSCHLAND GMBH (DE) 2020-04-28 US disclosed
US-20180237932-A1 COPPER PLATING BATH COMPOSITION AND METHOD FOR DEPOSITION OF COPPER ATOTECH USA, LLC 2018-08-23 US disclosed
EP-3141633-B1 COPPER PLATING BATH COMPOSITION ATOTECH DEUTSCHLAND GMBH (DE) 2018-05-02 EP disclosed
EP-3141633-A1 COPPER PLATING BATH COMPOSITION ATOTECH Deutschland GmbH (DE) 2017-03-15 EP disclosed