⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131519 | 1.00 | — | — | |
| Water SCHEMBL8588805 | 0.97 | ALDH1A1 (0.40) | — | |
| Water SCHEMBL28155912 | 0.97 | ALDH1A1 (0.40) | — | |
| Benzene SCHEMBL25304465 | 0.91 | HTR1A (0.41) | — | |
| SCHEMBL28180381 | 0.82 | — | — | |
| SCHEMBL18601329 | 0.80 | KMT2A (0.49) | — | |
| Hydrochloric Acid SCHEMBL21990817 | 0.80 | — | — | |
| Bromide SCHEMBL27414502 | 0.80 | — | — | |
| SCHEMBL26733446 | 0.80 | ALDH1A1 (0.40) | — | |
| SCHEMBL28162974 | 0.79 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2980172-B1 | SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM | SHINETSU CHEMICAL CO (JP) | 2016-11-02 | — | — | EP | disclosed |
| EP-2980172-A1 | SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-02-03 | — | — | EP | disclosed |