⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9744478 | 0.97 | ALDH1A1 (0.54) | — | |
| SCHEMBL10699211 | 0.97 | ALDH1A1 (0.54) | — | |
| SCHEMBL11076142 | 0.95 | ALDH1A1 (0.52) | — | |
| SCHEMBL5505753 | 0.92 | ALDH1A1 (0.48) | — | |
| SCHEMBL9819401 | 0.90 | LMNA (0.52) | — | |
| SCHEMBL10868798 | 0.90 | LMNA (0.52) | — | |
| SCHEMBL28101187 | 0.90 | LMNA (0.52) | — | |
| SCHEMBL10998500 | 0.90 | LMNA (0.52) | — | |
| SCHEMBL7755390 | 0.90 | LMNA (0.52) | — | |
| SCHEMBL9758405 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4334 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12525445-B2 | Process solution for polymer processing | DONGWOO FINE-CHEM CO., LTD. (KR) | 2026-01-13 | — | — | US | claimed |
| US-12459949-B2 | Light-emitting device and method of manufacturing the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-11-04 | — | — | US | claimed |
| EP-4611631-A2 | METHOD AND DEVICE FOR DIAGNOSIS OF MEDICAL CONDITIONS | Nanose Medical Ltd. (IL) | 2025-09-10 | — | — | EP | claimed |
| EP-4490238-B1 | UV-CURABLE INK COMPOSITION BASED ON RED-EMITTING QUANTUM DOTS, METHOD FOR DEPOSITING INK COMPOSITION AND LIGHT EMITTING DEVICE | QNA TECH S A (PL) | 2025-07-30 | — | — | EP | claimed |
| EP-4590782-A1 | GAS-PHASE COMPOSITION FOR INHIBITING CORROSION EXPOSED TO CONDENSED WATER | Arkema France (FR) | 2025-07-30 | — | — | EP | claimed |
| EP-4587527-A1 | INK COMPOSITION BASED ON QUANTUM DOTS WITH INCREASING QUANTUM YIELD OVER STORAGE TIME, METHOD OF ITS PREPARATION AND USE | QNA Technology S.A. (PL) | 2025-07-23 | — | — | EP | claimed |
| WO-2025102202-A1 | POLYISOCYANATE COMPOSITION, AND COATING LAYER HAVING IMPROVED CHEMICAL RESISTANCE | 万华化学集团股份有限公司 | 2025-05-22 | — | — | WO | claimed |
| CN-119978314-A | Polyisocyanate composition and coating with improved chemical resistance | 万华化学集团股份有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119912730-A | High-strength high-toughness cellulose-based bioplastic, preparation method and application | 江南大学 | 2025-05-02 | — | — | CN | claimed |
| US-12283647-B2 | Chelating agents for quantum dot precursor materials in color conversion layers for micro-LEDs | APPLIED MATERIALS, INC. (US) | 2025-04-22 | — | — | US | claimed |
| EP-2142485-A1 | METALLIC SURFACE ENHANCEMENT | Enthone, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| EP-2099551-A2 | EXTRACTION MEDIUM USED IN A METHOD FOR CAPTURING CARBON DIOXIDE CONTAINED IN A GASEOUS EFFLUENT | IFP (FR) | 2009-09-16 | — | — | EP | claimed |
| WO-2009067446-A1 | ANTI-TARNISH COATING | ENTHONE INC. (US) | 2009-05-28 | — | — | WO | claimed |
| WO-2008131206-A1 | METALLIC SURFACE ENHANCEMENT | ENTHONE INC. (US) | 2008-10-30 | — | — | WO | claimed |
| WO-2008068411-A2 | EXTRACTION MEDIUM USED IN A METHOD FOR CAPTURING CARBON DIOXIDE CONTAINED IN A GASEOUS EFFLUENT | IFP (FR) | 2008-06-12 | — | — | WO | claimed |
| WO-2008068410-A2 | ABSORBING SOLUTION USED IN A METHOD FOR CAPTURING CARBON DIOXIDE CONTAINED IN A GASEOUS EFFLUENT | IFP (FR) | 2008-06-12 | — | — | WO | claimed |
| US-20070048637-A1 | Arylamine polymer and organic thin film transistor | RICOH COMPANY LIMITED (JP) | 2007-03-01 | — | — | US | claimed |
| US-20050276993-A1 | Electroluminescent device using metal nanoparticles | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-15 | — | — | US | claimed |
| US-5922633-A | THERMAL LATENT ACID CATALYST CONSISTS OF AN EPOXY COMPOUND, A SULFUR COMPOUND AND LEWIS ACID | NOF CORPORATION (JP) | 1999-07-13 | — | — | US | claimed |
| US-5409808-A | Excellent sensitivity and gradation; improved storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1995-04-25 | — | — | US | claimed |