SCHEMBL1861083

SCHEMBL1861083

NC(=O)C=CF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15545909 1.00
SCHEMBL16859908 1.00 ALDH1A1 (0.39)
SCHEMBL18030203 1.00
SCHEMBL27641218 0.76 ALDH1A1 (0.50)
SCHEMBL156118 0.76
SCHEMBL245241 0.76
SCHEMBL156117 0.76
SCHEMBL28999926 0.73
Hydrochloric Acid SCHEMBL9156886 0.72
SCHEMBL9027113 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118530412-A Binder for negative electrode, negative electrode slurry, negative electrode, and lithium battery 深圳好电科技有限公司 2024-08-23 CN claimed
CN-113402412-B (E) Method for synthesizing (E) -beta-fluoroacrylamide derivative 温州大学 2023-02-14 CN claimed
CN-113402412-A (E) Method for synthesizing (beta) -fluoroacrylamide derivative 温州大学 2021-09-17 CN claimed
US-7939244-B2 Photosensitive hardmask for microlithography BREWER SCIENCE INC. (US) 2011-05-10 US claimed
US-20090297784-A1 Photosensitive hardmask for microlithography BREWER SCIENCE INC. 2009-12-03 US claimed
WO-2009132023-A2 PHOTOSENSITIVE HARDMASK FOR MICROLITHOGRAPHY BREWER SCIENCE INC. (US) 2009-10-29 WO claimed
CN-117304095-B N-aryl-N-arpropargyl-aromatic acetamide compound and pharmaceutical application thereof ZHEJIANG UNIVERSITY (CN) 2026-05-26 CN disclosed
CN-121733874-B Soft tensile all-cotton spunlaced fabric and preparation method and application thereof 江华新材料科技(江苏)有限公司 2026-05-19 CN disclosed
WO-2025243001-A1 COVALENT TAG UNIVERSITY OF DUNDEE (GB) 2025-11-27 WO disclosed
CN-120137528-A High-transmittance low-haze photo-curing release agent 常州工学院 2025-06-13 CN disclosed
CN-120117999-A Fluorotranilast derivatives and medical application thereof 中国药科大学 2025-06-10 CN disclosed
WO-2025052129-A1 PYRIDINE DERIVATIVES WHICH ACT AS INHIBITORS OF MPTP. NRG THERAPEUTICS LTD (GB) 2025-03-13 WO disclosed
CN-119234004-A Fluorine-containing polymer fluorine-containing composition 大金工业株式会社 2024-12-31 CN disclosed
EP-0464488-B1 Optically active N-alpha-fluoroacryloyl-aminoacid derivatives, their preparation, optically active polymers prepared therefrom and their use for the separation of racemates BAYER AG (DE) 1995-09-27 EP disclosed
US-5354884-A Polymer used as adsorbants for the chromatographic resolution of racemates into their enantiomers BAYER AKTIENGESELLSCHAFT (DE) 1994-10-11 US disclosed
US-5292924-A Optically active N-α-fluoroacryloylamino acid polymers for the resolution of racemates BAYER AKTIENGESELLSCHAFT (DE) 1994-03-08 US disclosed
EP-0464487-A1 Optically active alpha-fluoro-acrylamides, their preparation, polymers thereof and their use in the separation of racemates BAYER AG (DE) 1992-01-08 EP disclosed
EP-0464488-A2 Optically active N-alpha-fluoroacryloyl-aminoacid derivatives, their preparation, optically active polymers prepared therefrom and their use for the separation of racemates BAYER AG (DE) 1992-01-08 EP disclosed
US-4863823-A Electrophotographic member with the surface layer having a fluorine type resin powder and a fluorine type block polymer CANON KABUSHIKI KAISHA (JP) 1989-09-05 US disclosed
EP-0279331-A2 Alpha-fluoroacrylic acid salt polymer and its use DAIKIN INDUSTRIES, LIMITED (JP) 1988-08-24 EP disclosed