Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 4/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 10/20 | 0.38 |
| ▸ | CNR1 | P21554 | 2/20 | 0.37 |
| ▸ | CNR2 | P34972 | 2/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | G6PD | P11413 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25738341 | 0.99 | PTGS2 (0.45) | PTGS2MEN1HTTKMT2ASOAT1 | |
| SCHEMBL17285481 | 0.88 | MEN1 (0.43) | PTGS2MEN1HTTKMT2ACNR1 | |
| SCHEMBL10192728 | 0.87 | MEN1 (0.47) | PTGS2MEN1HTTKMT2ACNR1 | |
| SCHEMBL25738337 | 0.87 | PTGS2 (0.47) | PTGS2MEN1HTTKMT2ACNR1 | |
| SCHEMBL18872216 | 0.86 | MEN1 (0.45) | PTGS2MEN1HTTKMT2ASOAT1 | |
| SCHEMBL14839250 | 0.86 | MEN1 (0.52) | PTGS2MEN1HTTKMT2ACNR1 | |
| SCHEMBL25738336 | 0.86 | PTGS2 (0.48) | PTGS2MEN1HTTKMT2ASOAT1 | |
| SCHEMBL15521629 | 0.85 | PTGS2 (0.48) | PTGS2HTTSOAT1CNR2G6PD | |
| SCHEMBL25738335 | 0.84 | PTGS2 (0.49) | PTGS2MEN1HTTKMT2ASOAT1 | |
| SCHEMBL18256394 | 0.83 | PTGS2 (0.43) | PTGS2MEN1HTTKMT2ACNR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11733608-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-22 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20170108775-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | disclosed |
| US-20170075218-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11733608-B2 | Resist composition and patterning process | HNRNPU, INSR, BICRA | PTGS2 4700/4885MEN1 2209/4885HTT 698/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.