Hydrochloric Acid

Hydrochloric Acid

SCHEMBL1864614

C1=CC2C3C=CC(C3)C2C1.[Au+].[Cl-]

nearest known ligand 0.91

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.91
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL695682 0.95 ALDH1A1 (0.91) ALDH1A1POLB
Hydrochloric Acid SCHEMBL9822694 0.95 ALDH1A1 (0.91) ALDH1A1POLB
Hydrochloric Acid SCHEMBL5826346 0.95 ALDH1A1 (0.91) ALDH1A1POLB
Hydrochloric Acid SCHEMBL5186013 0.95 ALDH1A1 (0.91) ALDH1A1POLB
Hydrochloric Acid SCHEMBL9247187 0.95 ALDH1A1 (0.91) ALDH1A1POLB
SCHEMBL24895090 0.95 ALDH1A1 (1.00) ALDH1A1POLB
SCHEMBL11666255 0.95 ALDH1A1 (1.00) ALDH1A1POLB
SCHEMBL20721705 0.95 ALDH1A1 (1.00) ALDH1A1POLB
SCHEMBL7616653 0.95 ALDH1A1 (1.00) ALDH1A1POLB
SCHEMBL15576 0.95 ALDH1A1 (1.00) ALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5055537-A METAL-CONTAINING ORGANIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1991-10-08 US claimed
US-4927897-A Metal-containing organic polymer and use thereof FUJI PHOTO FILM CO., LTD. (JP) 1990-05-22 US claimed
US-7947328-B2 Metal pattern forming method FUJIFILM CORPORATION (JP) 2011-05-24 US disclosed
US-20090087570-A1 METAL PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-7291385-B2 Conductive film and method for preparing the same FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
US-20050040535-A1 Conductive film and method for preparing the same FUJI PHOTO FILM CO., LTD. 2005-02-24 US disclosed
EP-0892089-A2 Metallized material-making method Fuji Photo Film Co., Ltd. (JP) 1999-01-20 EP disclosed
US-5055537-A METAL-CONTAINING ORGANIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1991-10-08 US disclosed
US-4927897-A Metal-containing organic polymer and use thereof FUJI PHOTO FILM CO., LTD. (JP) 1990-05-22 US disclosed
EP-0084330-A2 Multilayered flat product BAYER AG (DE) 1983-07-27 EP disclosed
EP-0066073-A1 Metallised flat textile materials provided with electrically conductive contacts, and their manufacture BAYER AG (DE) 1982-12-08 EP disclosed
EP-0043485-A1 Method of activating surfaces for electroless plating BAYER AG (DE) 1982-01-13 EP disclosed