Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC9A1 | P19634 | 5/20 | 0.52 |
| ▸ | POLB | P06746 | 2/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | ATM | Q13315 | 1/20 | 0.52 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.52 |
| ▸ | APAF1 | O14727 | 1/20 | 0.47 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | THPO | P40225 | 1/20 | 0.47 |
| ▸ | CYP4Z1 | Q86W10 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7048241 | 0.85 | SLC9A1 (0.48) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL4221863 | 0.85 | SLC9A1 (0.48) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL9091544 | 0.84 | POLB (0.55) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL9220916 | 0.84 | SLC9A1 (0.55) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL14422298 | 0.84 | SLC9A1 (0.55) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL1083846 | 0.84 | ALDH1A1 (0.58) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL23997999 | 0.82 | SLC9A1 (0.46) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL24762734 | 0.81 | SLC9A1 (0.44) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL5788882 | 0.81 | SLC9A1 (0.44) | SLC9A1POLBMAPK1ATMKEAP1 | |
| SCHEMBL23791679 | 0.81 | SLC9A1 (0.52) | SLC9A1POLBMAPK1ATMKEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108621033-B | Polishing method of polishing pad | 中芯国际集成电路制造(上海)有限公司 | 2020-04-07 | — | — | CN | claimed |
| US-8864860-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2014-10-21 | — | — | US | claimed |
| US-20030000846-A1 | Plating method | SHIPLEY COMPANY, L.L.C. | 2003-01-02 | — | — | US | claimed |
| EP-1260607-A2 | Plating method | Shipley Company LLC (US) | 2002-11-27 | — | — | EP | claimed |
| US-5548003-A | ADDUCT DISPERSED IN WATER-BASED PRINTING INK | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1996-08-20 | — | — | US | claimed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| CN-114600045-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| EP-4050054-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHINETSU CHEMICAL CO (JP) | 2025-04-23 | — | — | EP | disclosed |
| CN-111338181-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2024-11-26 | — | — | CN | disclosed |
| CN-112136081-B | Photosensitive transfer material, method for manufacturing circuit wiring, and method for manufacturing touch panel | 富士胶片株式会社 | 2024-11-19 | — | — | CN | disclosed |
| CN-112204468-B | Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2024-09-17 | — | — | CN | disclosed |
| US-20230305403-A1 | PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20080035489-A1 | Plating process | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-02-14 | — | — | US | disclosed |
| EP-1865563-A2 | Light assisted electro plating process | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-12-12 | — | — | EP | disclosed |
| US-20030000846-A1 | Plating method | SHIPLEY COMPANY, L.L.C. | 2003-01-02 | — | — | US | disclosed |
| EP-1260607-A2 | Plating method | Shipley Company LLC (US) | 2002-11-27 | — | — | EP | disclosed |
| EP-1165500-A1 | AMIDE DERIVATIVES AS INHIBITORS OF MATRIX METALLOPROTEINASES,TNF-ALPHA,AND AGGRECANASE | Du Pont Pharmaceuticals Company (US) | 2002-01-02 | — | — | EP | disclosed |
| WO-2000059874-A1 | NOVEL AMIDE DERIVATIVES AS INHIBITORS OF MATRIX METALLOPROTEINASES, TNF-α, AND AGGRECANASE | DU PONT PHARMACEUTICALS COMPANY (US) | 2000-10-12 | — | — | WO | disclosed |
| US-5548003-A | ADDUCT DISPERSED IN WATER-BASED PRINTING INK | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1996-08-20 | — | — | US | disclosed |
| EP-0150380-A1 | Process for the preparation of N-vinylated unsaturated nitrogen-containing five-membered heterocycles | BAYER AG (DE) | 1985-08-07 | — | — | EP | disclosed |