SCHEMBL18674243

SCHEMBL18674243

C=C(C)C(=O)OC1(C(C)C)CCN(C(=O)OC(C)(C)C)CC1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
TSHR P16473 2/20 0.38
ALOX15 P16050 1/20 0.38
ATM Q13315 2/20 0.36
HPGD P15428 1/20 0.36
EPHX2 P34913 1/20 0.36
HTT P42858 2/20 0.36
NPC1 O15118 1/20 0.35
ALDH1A1 P00352 1/20 0.35
MAPT P10636 1/20 0.35
MAPK1 P28482 1/20 0.35
RAB9A P51151 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
RECQL P46063 1/20 0.35
EPHX1 P07099 1/20 0.35
GPR119 Q8TDV5 2/20 0.33
GPR183 P32249 1/20 0.33
CCR2 P41597 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18674259 0.82 USP2 (0.44) USP2SMN1; SMN2TSHRALOX15ATM
SCHEMBL31094903 0.80 USP2 (0.47) USP2SMN1; SMN2TSHRALOX15ATM
SCHEMBL18674264 0.78 USP2 (0.41) USP2SMN1; SMN2TSHRALOX15ATM
SCHEMBL18674252 0.77 USP2 (0.40) USP2SMN1; SMN2TSHRALOX15ATM
SCHEMBL674145 0.77 TSHR (0.41) TSHRALDH1A1
SCHEMBL18674244 0.75 EPHX1 (0.43) USP2SMN1; SMN2HPGDEPHX2ALDH1A1
SCHEMBL15447125 0.75 USP2 (0.51) USP2SMN1; SMN2TSHRALOX15ATM
SCHEMBL18674250 0.74 EPHX1 (0.45) USP2SMN1; SMN2HPGDEPHX2ALDH1A1
SCHEMBL27099944 0.74 TSHR (0.49) TSHRALOX15ATMGPR119
SCHEMBL12349928 0.73 USP2 (0.50) USP2SMN1; SMN2TSHRALOX15ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11016388-B2 Overcoat compositions and methods for photolithography ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2021-05-25 US disclosed
US-10564542-B2 Photoresist compositions and methods DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2020-02-18 US disclosed
US-20170090287-A1 OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20170090287-A1 OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11016388-B2 Overcoat compositions and methods for photolithography OGT, COLGALT1, PARG USP2 717/4885SMN1; SMN2 4742/4885TSHR 4812/4885
US-10564542-B2 Photoresist compositions and methods PARG, PNN, PARN USP2 2213/4885SMN1; SMN2 4279/4885TSHR 4722/4885
US-20170090287-A1 OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY OGT, COLGALT1, PARG USP2 717/4885SMN1; SMN2 4742/4885TSHR 4812/4885
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS PARG, PNN, PARN USP2 2213/4885SMN1; SMN2 4279/4885TSHR 4722/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.