SCHEMBL18674244

SCHEMBL18674244

C=C(C)C(=O)OC1(C2CCCC2)CCN(C(=O)OC(C)(C)C)CC1

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.43
HPGD P15428 1/20 0.42
USP2 O75604 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
RECQL P46063 1/20 0.38
EPHX2 P34913 1/20 0.36
GPR119 Q8TDV5 5/20 0.36
MAPT P10636 2/20 0.35
KDM4E B2RXH2 1/20 0.35
THRB P10828 1/20 0.35
PTPN2 P17706 1/20 0.35
PTPN1 P18031 1/20 0.35
PTPN6 P29350 1/20 0.35
DDB1 Q16531 1/20 0.35
CRBN Q96SW2 1/20 0.35
MEN1 O00255 1/20 0.34
ALDH1A1 P00352 1/20 0.34
KMT2A Q03164 1/20 0.34
PREP P48147 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18674250 0.99 EPHX1 (0.45) EPHX1HPGDUSP2SMN1; SMN2RECQL
SCHEMBL6374668 0.81 EPHX1 (0.49) EPHX1HPGDUSP2SMN1; SMN2RECQL
SCHEMBL6132692 0.80 EPHX1 (0.51) EPHX1HPGDUSP2SMN1; SMN2RECQL
SCHEMBL18674261 0.79 EPHX1 (0.42) EPHX1HPGDUSP2SMN1; SMN2RECQL
SCHEMBL18674259 0.79 USP2 (0.44) EPHX1HPGDUSP2SMN1; SMN2RECQL
SCHEMBL18674266 0.78 EPHX1 (0.44) EPHX1HPGDUSP2SMN1; SMN2RECQL
SCHEMBL954627 0.78 ALDH1A1 (0.34) MEN1ALDH1A1KMT2A
SCHEMBL9893522 0.78 ALDH1A1 (0.34) MEN1ALDH1A1KMT2A
SCHEMBL18068569 0.77 EPHX1 (0.34) EPHX1SMN1; SMN2
SCHEMBL7920362 0.76 ALDH1A1 (0.33) MEN1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11016388-B2 Overcoat compositions and methods for photolithography ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2021-05-25 US disclosed
US-10564542-B2 Photoresist compositions and methods DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2020-02-18 US disclosed
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20170090287-A1 OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20170090287-A1 OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11016388-B2 Overcoat compositions and methods for photolithography OGT, COLGALT1, PARG EPHX1 1270/4885HPGD 2062/4885USP2 717/4885
US-10564542-B2 Photoresist compositions and methods PARG, PNN, PARN EPHX1 3934/4885HPGD 1308/4885USP2 2213/4885
US-20170090287-A1 OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY OGT, COLGALT1, PARG EPHX1 1270/4885HPGD 2062/4885USP2 717/4885
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS PARG, PNN, PARN EPHX1 3934/4885HPGD 1308/4885USP2 2213/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.