Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CTSK | P43235 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | DDB1 | Q16531 | 1/20 | 0.34 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.34 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TACR1 | P25103 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18674259 | 0.82 | USP2 (0.44) | USP2SMN1; SMN2HPGDEPHX2RECQL | |
| SCHEMBL2943334 | 0.80 | USP2 (0.47) | USP2SMN1; SMN2CTSKHPGDEPHX2 | |
| SCHEMBL18674256 | 0.80 | USP2 (0.42) | USP2SMN1; SMN2CTSKHPGDEPHX2 | |
| SCHEMBL20414907 | 0.79 | CTSK (0.50) | USP2SMN1; SMN2CTSKHPGDEPHX2 | |
| SCHEMBL18674243 | 0.78 | USP2 (0.41) | USP2SMN1; SMN2HPGDEPHX2RECQL | |
| SCHEMBL673334 | 0.77 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL18674244 | 0.75 | EPHX1 (0.43) | USP2SMN1; SMN2HPGDEPHX2RECQL | |
| SCHEMBL21134747 | 0.75 | USP2 (0.38) | USP2SMN1; SMN2HPGDEPHX2DDB1 | |
| SCHEMBL7750228 | 0.75 | USP2 (0.49) | USP2SMN1; SMN2HPGDEPHX2RECQL | |
| SCHEMBL18314373 | 0.75 | USP2 (0.43) | USP2SMN1; SMN2HPGDEPHX2ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113527571-B | Polymer, primer composition comprising the same, and patterning method | 罗门哈斯电子材料韩国有限公司 | 2023-08-04 | — | — | CN | disclosed |
| US-11567409-B2 | Polymers, underlayer coating compositions comprising the same, and patterning methods | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-01-31 | — | — | US | disclosed |
| CN-113527571-A | Polymer, primer composition comprising same, and patterning method | 罗门哈斯电子材料韩国有限公司 | 2021-10-22 | — | — | CN | disclosed |
| US-20210324122-A1 | POLYMERS, UNDERLAYER COATING COMPOSITIONS COMPRISING THE SAME, AND PATTERNING METHODS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2021-10-21 | — | — | US | disclosed |
| US-11016388-B2 | Overcoat compositions and methods for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-05-25 | — | — | US | disclosed |
| US-10564542-B2 | Photoresist compositions and methods | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2020-02-18 | — | — | US | disclosed |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20170090283-A1 | PHOTORESIST COMPOSITIONS AND METHODS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20170090283-A1 | PHOTORESIST COMPOSITIONS AND METHODS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11016388-B2 | Overcoat compositions and methods for photolithography | OGT, COLGALT1, PARG | USP2 717/4885SMN1; SMN2 4742/4885CTSK 1573/4885 |
| US-10564542-B2 | Photoresist compositions and methods | PARG, PNN, PARN | USP2 2213/4885SMN1; SMN2 4279/4885CTSK 801/4885 |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | OGT, COLGALT1, PARG | USP2 717/4885SMN1; SMN2 4742/4885CTSK 1573/4885 |
| US-20170090283-A1 | PHOTORESIST COMPOSITIONS AND METHODS | PARG, PNN, PARN | USP2 2213/4885SMN1; SMN2 4279/4885CTSK 801/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.