Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR1H2 | P55055 | 11/20 | 0.53 |
| ▸ | NR1H3 | Q13133 | 11/20 | 0.53 |
| ▸ | MLYCD | O95822 | 4/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.43 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13324724 | 0.83 | NR1H2 (0.56) | NR1H2NR1H3MLYCDSMN1; SMN2LMNA | |
| SCHEMBL6337812 | 0.80 | NR1H2 (0.53) | NR1H2NR1H3MLYCDSMN1; SMN2LMNA | |
| SCHEMBL26299730 | 0.79 | PDE2A (0.50) | HDAC1HDAC8HDAC6 | |
| SCHEMBL18202055 | 0.78 | PTPN5 (0.57) | NR1H2NR1H3MLYCD | |
| SCHEMBL131990 | 0.78 | NR1H2 (0.68) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL2618661 | 0.77 | NR1H2 (0.55) | NR1H2NR1H3MLYCD | |
| SCHEMBL19019482 | 0.77 | MLYCD (0.50) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL18030102 | 0.77 | NR1H3 (0.49) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL18408683 | 0.76 | MLYCD (0.49) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL16875252 | 0.75 | NR1H2 (0.50) | NR1H2NR1H3MLYCDSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9612535-B2 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |