SCHEMBL18698646

SCHEMBL18698646

CNS(=O)(=O)c1ccc(N2CCCC2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.60
ALDH1A1 P00352 4/20 0.60
RECQL P46063 1/20 0.60
LMNA P02545 5/20 0.55
GFER P55789 2/20 0.55
L3MBTL1 Q9Y468 1/20 0.55
SMN1; SMN2 Q16637 4/20 0.54
HTT P42858 2/20 0.54
MAPK1 P28482 1/20 0.54
GAA P10253 1/20 0.52
MMP3 P08254 1/20 0.51
MMP8 P22894 1/20 0.51
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA3 P07451 1/20 0.50
CA4 P22748 1/20 0.50
CA6 P23280 1/20 0.50
CA5A P35218 1/20 0.50
CA7 P43166 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17893595 0.84 SMN1; SMN2 (0.47) MAPTALDH1A1RECQLLMNAGFER
SCHEMBL709838 0.84 ALDH1A1 (0.63) MAPTALDH1A1RECQLLMNASMN1; SMN2
SCHEMBL10680426 0.83 CHKA (0.47) MAPTALDH1A1RECQLLMNASMN1; SMN2
SCHEMBL2626621 0.82 SMN1; SMN2 (0.44) MAPTALDH1A1RECQLLMNASMN1; SMN2
SCHEMBL13149246 0.82 GAA (0.54) MAPTALDH1A1GFERSMN1; SMN2GAA
SCHEMBL19629803 0.80 GFER (0.54) MAPTALDH1A1RECQLLMNAGFER
SCHEMBL19629740 0.80 GFER (0.64) MAPTALDH1A1RECQLLMNAGFER
SCHEMBL13150289 0.79 MEN1 (0.49) MAPTALDH1A1RECQLLMNASMN1; SMN2
SCHEMBL19627410 0.79 MAPT (0.60) MAPTALDH1A1RECQLLMNAGFER
SCHEMBL12826096 0.79 LMNA (0.59) MAPTALDH1A1RECQLLMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9612535-B2 Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-04-04 US disclosed