Benzoquinone

Benzoquinone

SCHEMBL1873085

O=C1C=CC(=O)C=C1.[H+]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoquinone SCHEMBL28655022 1.00
Benzoquinone SCHEMBL10506648 0.94 ALDH1A1 (1.00)
Benzoquinone SCHEMBL3208089 0.94
Benzoquinone SCHEMBL30679171 0.94
Benzoquinone SCHEMBL5308519 0.94 ALDH1A1 (1.00)
Benzoquinone SCHEMBL460082 0.94 ALDH1A1 (1.00)
Benzoquinone SCHEMBL18103 0.94
Benzoquinone SCHEMBL3235600 0.89 ALDH1A1 (0.89)
Benzoquinone SCHEMBL4207161 0.89 ALDH1A1 (0.89)
Benzoquinone SCHEMBL21494172 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110196531-A A kind of dry film photoresist 珠海市能动科技光学产业有限公司 2019-09-03 CN claimed
CN-108255014-B A kind of dry film photoresist containing modified polyurethane and photo-curing monomer 珠海市能动科技光学产业有限公司 2019-07-02 CN claimed
CN-109072089-A Sulfonated aromatic compound CMBLU企划股份公司 2018-12-21 CN claimed
CN-108255014-A A kind of dry film photoresist containing modified polyurethane and photo-curing monomer 珠海市能动科技光学产业有限公司 2018-07-06 CN claimed
CN-108227379-A A kind of dry film photoresist containing cellulosic material 珠海市能动科技光学产业有限公司 2018-06-29 CN claimed
CN-103080084-B Preparation method of TMHQ 帝斯曼知识产权资产管理有限公司 2017-07-07 CN claimed
CN-106573863-A Crystallized hydroquinone and methods of making 伊士曼化工公司 2017-04-19 CN claimed
CN-102650825-B Dry film photoresist containing adhesive additive and plasticizer ZHONGSHAN LISHUN IND CO LTD 2014-08-27 CN claimed
CN-102650825-A Dry film photoresist containing adhesive additive and plasticizer ZHONGSHAN LISHUN IND CO LTD 2012-08-29 CN claimed
CN-101587960-A A hydrophilic/hedrophobic pattern surface and preparation and using method GM GLOBAL TECH OPERATIONS INC (US) 2009-11-25 CN claimed
CN-100472834-C Mfg method of fall carrier capture structure organic LED CHANGCHUN APPLIED CHEMISTRY (CN) 2009-03-25 CN claimed
CN-100351219-C Grignard reagent coupling process of synthesizing coenzyme Q10 KUNMING TAOHUI BIOLOG INDUSTRY (CN) 2007-11-28 CN claimed
CN-1609207-A Grignard reagent coupling process of synthesizing coenzyme Q10 KUNMING TAOHUI BIOLOG INDUSTRY (CN) 2005-04-27 CN claimed
CN-1601780-A Mfg method of fall carrier capture structure organic LED CHANGCHUN APPLIED CHEMISTRY (CN) 2005-03-30 CN claimed
CN-118126316-A Organic polymer electrode material based on benzoquinone and preparation method and application thereof 浙江理工大学嵊州创新研究院有限公司 2024-06-04 CN disclosed
CN-116688218-A Polysaccharide-based hydrogel tissue glue and preparation method and application thereof 南京工业大学 2023-09-05 CN disclosed
CN-108275766-B Method for promoting Fe (III) -class Fenton system to repair organic matter polluted water body by using hydrogen 苏州科技大学 2022-01-28 CN disclosed
CN-1601780-A Mfg method of fall carrier capture structure organic LED CHANGCHUN APPLIED CHEMISTRY (CN) 2005-03-30 CN disclosed
US-5981238-A REACTING A DIAMINE AND FUMARIC ACID USING MICROORGANISM OR EXTRACT HAVING LYASE ACTIVITY; PRESENCE OF ALKALINE EARTH METAL, IRON, ZINC, COPPER, NICKEL, ALUMINUM, TITANIUM OR MANGANESE IONS INCREASES YIELD BY FORMING STABLE COMPLEXES MITSUBISHI RAYON CO., LTD. (JP) 1999-11-09 US disclosed
CN-1009689-B chlorophyll photovoltaic cell and preparation method thereof UNIV SHANDONG (CN) 1990-09-19 CN disclosed