Acrylic Acid

Acrylic Acid

SCHEMBL1874676

C=CC(=O)O.CSCC[C@H](NCC(O)CCl)C(=O)O

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.39
ALDH1A1 P00352 2/20 0.37
KDM4E B2RXH2 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PKM P14618 1/20 0.36
GAA P10253 1/20 0.36
RAB9A P51151 1/20 0.35
RNPEP Q9H4A4 1/20 0.35
NPSR1 Q6W5P4 1/20 0.34
FNTA P49354 3/20 0.34
FNTB P49356 3/20 0.34
CA2 P00918 2/20 0.33
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CA1 P00915 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL1871172 0.85 LMNA (0.42) LMNAALDH1A1KDM4EL3MBTL1PKM
Acrylic Acid SCHEMBL1873140 0.83 LMNA (0.43) LMNAALDH1A1KDM4EL3MBTL1PKM
Acrylic Acid SCHEMBL1536190 0.80 LMNA (0.44) LMNAALDH1A1KDM4EL3MBTL1PKM
Acrylic Acid SCHEMBL4407719 0.79 GAA (0.43) LMNAALDH1A1KDM4EL3MBTL1PKM
SCHEMBL6010246 0.78 LMNA (0.46) LMNAALDH1A1KDM4EL3MBTL1PKM
SCHEMBL6010243 0.78 LMNA (0.46) LMNAALDH1A1KDM4EL3MBTL1PKM
Acrylic Acid SCHEMBL459617 0.77 ALDH1A1 (0.40) LMNAALDH1A1KDM4EL3MBTL1PKM
Acrylic Acid SCHEMBL7576370 0.77 GAA (0.42) LMNAALDH1A1KDM4EL3MBTL1PKM
SCHEMBL11031465 0.76 CA1 (0.39) LMNAALDH1A1KDM4EL3MBTL1PKM
SCHEMBL11031468 0.76 CA1 (0.39) LMNAALDH1A1KDM4EL3MBTL1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822127-B2 Photosensitive resin composition for black matrix LG CHEM, LTD. (KR) 2014-09-02 US disclosed
US-20110101268-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX LG CHEM, LTD. (KR) 2011-05-05 US disclosed