SCHEMBL187714

SCHEMBL187714

C[SiH](C)O[Si](C)(C)O[Si](C)(C)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9004474 0.97
SCHEMBL4761256 0.97
SCHEMBL9004473 0.97
SCHEMBL9004493 0.97
SCHEMBL9004508 0.97
SCHEMBL11950506 0.97
SCHEMBL3868343 0.97
SCHEMBL9004497 0.97
SCHEMBL9178213 0.97
SCHEMBL14902958 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 479 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
CN-114316269-B Preparation method and application of silicone resin 万华化学集团股份有限公司(CN) 2023-01-13 CN claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
CN-114196024-A Organic silicon modified phenolic resin and preparation method and application thereof 万华化学集团股份有限公司 2022-03-18 CN claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
EP-3735325-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2020-11-11 EP claimed
CN-111565859-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2020-08-21 CN claimed
US-20200035494-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-01-30 US claimed
US-20190211210-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2019-07-11 US claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
EP-1572781-A1 EPOXY-FUNCTIONAL HYBRID COPOLYMERS National Starch and Chemical Investment Holding Corporation (US) 2005-09-14 EP claimed
US-20050171317-A1 Synthesis of elastomeric carborane-siloxanes by hydrosilation reactions UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY, THE 2005-08-04 US claimed
US-20050171316-A1 Synthesis of elastomeric carborane-siloxanes by hydrosilation reactions THE GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF THE NAVY 2005-08-04 US claimed
US-6828404-B2 Alkoxysilyl siloxane substituted with at least one epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group RENSSELAER POLYTECHNIC INSTITUTE 2004-12-07 US claimed
WO-2004060976-A1 EPOXY-FUNCTIONAL HYBRID COPOLYMERS NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) 2004-07-22 WO claimed
US-20040127070-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. 2004-07-01 US claimed
US-20040122186-A1 Epoxy-functional hybrid copolymers HENKEL KGAA (DE) 2004-06-24 US claimed
US-20020137870-A1 Polymerizable siloxanes RENSSELAER POLYTECHNIC INSTITUTE 2002-09-26 US claimed
US-5188903-A Coatings THE DOW CHEMICAL COMPANY (US) 1993-02-23 US claimed