SCHEMBL18790515

SCHEMBL18790515

c1ccc2c(c1)oc1c3cc(-c4ccc5c(c4)c4ccccc4c4sc6ccccc6c54)ccc3c3ccccc3c21

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR2 Q92731 2/20 0.39
▸ ESR1 P03372 1/20 0.38
▸ ALOX5 P09917 2/20 0.34
▸ TNKS O95271 1/20 0.33
▸ TNKS2 Q9H2K2 1/20 0.33
▸ PRKDC P78527 1/20 0.33
▸ AHR P35869 1/20 0.33
▸ MEN1 O00255 3/20 0.32
▸ KMT2A Q03164 3/20 0.32
▸ KDM4E B2RXH2 2/20 0.32
▸ HPGD P15428 2/20 0.32
▸ HCRTR1 O43613 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ PTPN1 P18031 1/20 0.32
▸ MAPT P10636 3/20 0.32
▸ PLA2G2A P14555 3/20 0.32
▸ PLA2G4A P47712 3/20 0.32
▸ CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22010894 0.85 ALOX5 (0.41) ESR2ESR1ALOX5TNKSTNKS2
SCHEMBL20390240 0.82 LIMK1 (0.38) ESR2ESR1ALOX5TNKSTNKS2
SCHEMBL19108802 0.82 ESR2 (0.42) ESR2ESR1TNKSTNKS2AHR
SCHEMBL17944945 0.81 AHR (0.37) ESR2ESR1ALOX5TNKSTNKS2
SCHEMBL19108803 0.79 ESR2 (0.42) ESR2ESR1ALOX5TNKSTNKS2
SCHEMBL17167471 0.79 LIMK1 (0.40) ESR2ESR1ALOX5TNKSTNKS2
SCHEMBL15857020 0.79 LIMK1 (0.40) ESR2ESR1ALOX5TNKSTNKS2
SCHEMBL17932002 0.79 MAPT (0.37) ESR2ESR1ALOX5MEN1KMT2A
SCHEMBL17807286 0.79 ESR2 (0.38) ESR2ESR1ALOX5PRKDCAHR
SCHEMBL20127744 0.79 ESR2 (0.36) ESR2ESR1PRKDCPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10663863-B2 Method of producing layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2020-05-26 — — US disclosed
US-20170115572-A1 METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2017-04-27 — — US disclosed
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