⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3112270 | 0.78 | — | — | |
| SCHEMBL10158370 | 0.78 | — | — | |
| SCHEMBL22234184 | 0.78 | — | — | |
| SCHEMBL24438989 | 0.78 | — | — | |
| SCHEMBL29483881 | 0.78 | — | — | |
| SCHEMBL23498935 | 0.78 | — | — | |
| SCHEMBL4893281 | 0.78 | — | — | |
| SCHEMBL13182909 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL30399691 | 0.76 | GABRR1 (0.31) | — | |
| SCHEMBL4888998 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113788857-B | Phosphate ligand, preparation method and application thereof in preparation of linear aldehyde by catalyzing hydroformylation of terminal olefin | 万华化学集团股份有限公司 | 2023-03-03 | — | — | CN | claimed |
| US-4086210-A | Radiation sensitive polymeric o-nitrophenyl acetals | EASTMAN KODAK COMPANY (US) | 1978-04-25 | — | — | US | claimed |
| CN-113788857-B | Phosphate ligand, preparation method and application thereof in preparation of linear aldehyde by catalyzing hydroformylation of terminal olefin | 万华化学集团股份有限公司 | 2023-03-03 | — | — | CN | disclosed |
| EP-2958682-B1 | PRINTABLE RADIATION CURABLE BARRIER COATINGS | SUN CHEMICAL CORP (US) | 2018-04-25 | — | — | EP | disclosed |
| US-9701860-B2 | Printable radiation curable barrier coatings | SUN CHEMICAL CORPORATION (US) | 2017-07-11 | — | — | US | disclosed |
| US-20160009939-A1 | PRINTABLE RADIATION CURABLE BARRIER COATINGS | SUN CHEMICAL CORPORATION (US) | 2016-01-14 | — | — | US | disclosed |
| EP-2958682-A1 | PRINTABLE RADIATION CURABLE BARRIER COATINGS | Sun Chemical Corporation (US) | 2015-12-30 | — | — | EP | disclosed |
| WO-2014130311-A1 | PRINTABLE RADIATION CURABLE BARRIER COATINGS | SUN CHEMICAL CORPORATION (US) | 2014-08-28 | — | — | WO | disclosed |
| US-7989651-B2 | trimethoxysilylpropyl-carbamic acid oxiranylmethyl ester; reacting glycidol with gamma-isocyanatopropyltriethoxysilane in presence of dibutyltin laurate catalyst | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2011-08-02 | — | — | US | disclosed |
| US-7935752-B2 | Thermosetting resin composition and uses thereof | SHOWA DENKO K.K. (JP) | 2011-05-03 | — | — | US | disclosed |
| CN-101395223-A | Thermosetting resin composition and uses thereof | SHOWA DENKO KK (JP) | 2009-03-25 | — | — | CN | disclosed |
| US-6455666-B1 | POLYMERIZATION OF ADAMANTANE DICARBOXY AND DIHYDROXY DERIVATIVES | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-09-24 | — | — | US | disclosed |
| US-20020042496-A1 | Novel polyesters and production process thereof | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-04-11 | — | — | US | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6238842-B1 | SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6037413-A | POLYESTER HAVING EXCELLENT COMPATIBILITY WITH RESINOUS OR RUBBERY POLYMER; USEFUL FOR IMPROVING COATABILITY AND ADHESION | NIPPON ZEON CO, LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| EP-0894815-A1 | POLYESTER, PROCESS FOR THE PRODUCTION OF THE SAME, RESIN OR RUBB ER COMPOSITIONS CONTAINING THE SAME, AND MOLDINGS OF THE COMPOSITIONS | NIPPON ZEON CO., LTD. (JP) | 1999-02-03 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |