SCHEMBL18802736

SCHEMBL18802736

CC(C)(O)c1cccc(CCCCc2cccc(C(C)(C)O)c2)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.44
HDAC8 Q9BY41 1/20 0.44
LPL P06858 2/20 0.43
LIPG Q9Y5X9 2/20 0.43
TAAR1 Q96RJ0 1/20 0.43
CYP4F2 P78329 2/20 0.42
CYP4A11 Q02928 2/20 0.42
PPARG P37231 2/20 0.41
PPARA Q07869 2/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.40
IGF1R P08069 1/20 0.40
ALOX15 P16050 1/20 0.40
GABRA1 P14867 1/20 0.39
GABRG2 P18507 1/20 0.39
GABRB3 P28472 1/20 0.39
GABRA3 P34903 1/20 0.39
GABRA2 P47869 1/20 0.39
GABRB2 P47870 1/20 0.39
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802810 0.98 LPL (0.45) HDAC1HDAC8LPLLIPGTAAR1
SCHEMBL18802748 0.98 LPL (0.45) HDAC1HDAC8LPLLIPGTAAR1
SCHEMBL18802813 0.96 TAAR1 (0.43) HDAC1HDAC8LPLLIPGTAAR1
SCHEMBL18802729 0.92 TAAR1 (0.46) TAAR1CYP4F2CYP4A11CYP1A2CYP2C19
SCHEMBL3193136 0.91 CYP4F2 (0.45) HDAC1HDAC8LPLLIPGTAAR1
SCHEMBL4948885 0.89 TAAR1 (0.50) TAAR1CYP4F2CYP4A11CYP1A2CYP2C19
SCHEMBL28827060 0.85 TDP1 (0.43) TAAR1CYP4F2CYP4A11CYP1A2CYP2C19
SCHEMBL129592 0.83 KIF11 (0.46) CYP4F2CYP4A11CYP1A2CYP2C19GABRA1
SCHEMBL548707 0.83 CYP1A2 (0.42) TAAR1CYP4F2CYP4A11CYP1A2CYP2C19
SCHEMBL10709248 0.82 CYP1A2 (0.43) TAAR1CYP4F2CYP4A11CYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170121437-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK FUJIFILM CORPORATION (JP) 2017-05-04 US disclosed