Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18574330 | 0.78 | MEN1 (0.35) | KMT2ACYP2C9ALDH1A1MEN1MAPT | |
| SCHEMBL17812602 | 0.77 | KMT2A (0.44) | KMT2ANPSR1CYP2C9ALDH1A1 | |
| SCHEMBL17812755 | 0.76 | KMT2A (0.46) | KMT2ANPSR1CYP2C9 | |
| SCHEMBL17812781 | 0.76 | KMT2A (0.43) | KMT2ANPSR1CYP2C9ALDH1A1MEN1 | |
| SCHEMBL18717781 | 0.75 | ALDH1A1 (0.41) | NPSR1CYP2C9ALDH1A1TSHRGAA | |
| SCHEMBL17812628 | 0.75 | KMT2A (0.45) | KMT2ANPSR1ALDH1A1MEN1TSHR | |
| SCHEMBL18732579 | 0.73 | ALDH1A1 (0.42) | KMT2ANPSR1CYP2C9ALDH1A1MEN1 | |
| SCHEMBL18810206 | 0.73 | CSNK2A1 (0.36) | KMT2AMEN1 | |
| SCHEMBL15179666 | 0.72 | ALDH1A1 (0.41) | NPSR1CYP2C9ALDH1A1TSHRGAA | |
| SCHEMBL15179712 | 0.72 | KMT2A (0.42) | KMT2ANPSR1ALDH1A1MEN1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170121437-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |