Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | RORC | P51449 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17812602 | 0.98 | KMT2A (0.44) | KMT2ANPSR1CHRM2CYP2D6CHRM1 | |
| SCHEMBL17812680 | 0.86 | KMT2A (0.38) | KMT2ANPSR1CHRM2CYP2D6CHRM1 | |
| SCHEMBL17812741 | 0.85 | KMT2A (0.36) | KMT2ANPSR1CHRM2CYP2D6CHRM1 | |
| SCHEMBL17812628 | 0.84 | KMT2A (0.45) | KMT2ANPSR1CHRM2CYP2D6CHRM1 | |
| SCHEMBL19901112 | 0.84 | CHRM2 (0.38) | KMT2ACHRM2CYP2D6CHRM1KCNH2 | |
| SCHEMBL17812781 | 0.82 | KMT2A (0.43) | KMT2ANPSR1CHRM2CYP2D6CHRM1 | |
| SCHEMBL18905366 | 0.77 | KEAP1 (0.40) | KMT2ACHRM2CYP2D6CHRM1KCNH2 | |
| SCHEMBL18802913 | 0.76 | KMT2A (0.40) | KMT2ANPSR1CYP2C9 | |
| SCHEMBL19130799 | 0.75 | NPC1 (0.42) | KMT2ACHRM2CYP2D6CHRM1KCNH2 | |
| SCHEMBL18905316 | 0.75 | KEAP1 (0.41) | CHRM2CYP2D6CHRM1KCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160161850-A1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-09 | — | — | US | disclosed |